Piezoelectric thin film AlN has great potential for on-chip devices such as thin-film resonator (TFR)-based bandpass filters. The AlN electromechanical coupling constant, K(2), is an important material parameter that determines the maximum possible bandwidth for bandpass filters. Using a previously published extraction technique, the bulk c-axis electromechanical coupling constant was measured as a function of the AlN X-ray diffraction rocking curve [full width at half maximum (FWHM)]. For FWHM values of less than approximately 4 degrees , K (2) saturates at approximately 6.5%, equivalent to the value for epitaxial AlN. For FWHM values >4 degrees , K(2) gradually decreases to approximately 2.5% at a FWHM of 7.5 degrees . These results indicate that the maximum possible bandwidth for TFR-based bandpass filters using polycrystalline AlN is approximately 80 MHz and that, for 60-MHz bandwidth PCS applications, an AlN film quality of >5.5 degrees FWHM is required.
Thin-film piezoelectric materials such as ZnO and AlN have great potential for on-chip devices such as filters, actuators and sensors. The electromechanical coupling constant is an important material parameter which determines the piezoelectric response of these films. This paper presents a technique based on the Butterworth Van-Dyke (BVD) model which, together with a simple one-mask over-moded resonator, can be used to extract the bulk, one-dimensional electromechanical coupling constant K(2) of any piezoelectrically active thin-film. The BVD model is used to explicitly define the series resonance, parallel resonance, and quality factor Q of any given resonating mode. Common methods of defining the series resonance, parallel resonance, and Q are shown to be inaccurate for low coupling, lossy resonators such as the over-moded resonator. Specifically, an electromechanical coupling constant K(2) of (2.6+/-0.1)% was measured for an (002) c-axis textured AlN film with an X-ray diffraction rocking curve of 7.5 degrees using the BVD based extraction technique.
Aluminum nitride is a promising material for use in thin-film bulk acoustic wave resonators for applications in RF bandpass filters. This paper discusses the requirements needed for a dc magnetron sputtering system to grow piezoelectrically active films with x-ray diffraction rocking curves of 3.3° on silicon substrates, 5° on aluminum substrates and oxygen concentrations of l at.%. For applications in integrated resonators, a materials characterization is insufficient in predicting the subsequent device performance. A simple acoustic device structure which allows a quick measurement of the device performance is used to extract maximum effective coupling coefficients keff2 of 0.009% at 3.4GHz and 0.002% at 2.4GHz for two different films with rocking curves of 5.7° and 9.0° respectively. This parameter extraction technique may be used to make relative comparisons between films grown under different deposition conditions.
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