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It is shown that ammonothermal method can be successfully used to synthesize GaN powder of good crystallographic quality from ammonia solution at high pressure and a moderate temperature. The size of obtained GaN powder grains was of a few micrometers. The improvement of the powder crystalline quality (examined by X-ray rocking curve, scanning electroii microscopy and luminescence measurements) with increasing molar proportion of mineralizer was observed. It was therefore possible to conclude that high molar proportion of mineralizer in ammonia solution plays a crucial role in the polycrystal growth process. Visible luminescence of high efficiency from the GaN powder was found.

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Crystallization of GaN by hydride vapor phase epitaxy (HVPE) on ammonothermally grown GaN seed crystals is described. The initial growth conditions for HVPE are determined and applied for further bulk growth. Smooth GaN layers up to 1.1 mm thick and of excellent crystalline quality, without cracks, and with low dislocation density are obtained. Preparation of the free-standing HVPE-GaN crystal by slicing and structural and optical quality of the resulting wafer are presented.

Phone: þ48 22 814 02 07, Fax: þ48 22 811 56 07We are presenting some physical and chemical basis of ammonothermal method of bulk gallium nitride (GaN) synthesis in ammonobasic route. The substrates of polar, non-polar, and semi-polar orientation can be obtained by this method. Excellent structural and wide spectrum of electrical parameters of truly bulk GaN crystals obtained this way are revealed. Large progress in manufacturing of large size (1-in.) non-polar ammonothermal crystals is reported. A preliminary results on performance of the devices grown on ammonothermal GaN substrates will be shown.

In this paper we review the developments of producing non-polar (i.e. m-plane and a-plane) and semi-polar (i.e. (20.1)-plane) wafers by ammonothermal method. The growth method and polishing results are described. We succeeded in producing 26 mm × 26 mm non-and semi-polar wafers. These wafers possess outstanding structural and optical properties, with threading dislocation density of the order of 10 4 cm −3 . Detailed studies of homoepitaxial layers, as well as AlGaN heterostructures are also presented, showing the potential of studied ammonothermal substrates in the fabrication of optoelectronic devices.

GaN crystals are grown using ammonothermal method at pressures below 5 kbar and temperatures below 550°C. In this method, GaN is synthesised from high purity metallic gallium. The main role in the low temperature GaN crystallization is played by the chemically active and dense ammonia and dissolved mineralizer. Morphology of the obtained crystals as well as solubility experiments prove that gallium nitride is dissolved and crystallised from solution. Physical properties of GaN crystals obtained using ammonothermal method depend on the growth conditions and the type of mineralizer. All GaN samples reveal very intensive photoluminescence, also at room temperature. The spectra of crystals grown with lithium compound mineralizer are shifted towards higher energies in comparison to crystals grown with potassium based mineralizer. At helium temperatures, phosphorescence is also observed.