Aromatic self-assembled monolayers (SAMs) can be used as negative tone electron resists in functional surface lithographic fabrication. A dense and resistant molecular network is obtained under electron irradiation through the formation of a cross-linked network. The elementary processes and possible mechanisms involved were investigated through the response of a model aromatic SAM, p-terphenylthiol SAM, to low-energy electron (0-10 eV) irradiation. Energy loss spectra as well as vibrational excitation functions were measured using High Resolution Electron Energy Loss Spectroscopy (HREELS). A resonant electron attachment process was identified around 6 eV through associated enhanced excitation probability of the CH stretching modes ν(CH)(ph) at 378 meV. Electron irradiation at 6 eV was observed to induce a peak around 367 meV in the energy loss spectra, attributed to the formation of sp(3)-hybridized CHx groups within the SAM. This partial loss of aromaticity is interpreted to be the result of resonance formation, which relaxes by reorganization and/or CH bond dissociation mechanisms followed by radical chain reactions. These processes may also account for cross-linking induced by electron irradiation of aromatic SAMs in general.

Chemical reactivity is observed following electron irradiation of a binary mixture of ammonia (NH(3)) and acetic acid (CH(3)COOD) at 25 K, without any subsequent thermal activation, as evidenced by vibrational high resolution electron energy loss spectroscopy (HREELS). Analysis of the HREEL spectra and comparison with infrared and Raman data of different molecules are compatible with glycine formation in its zwitterionic form. The onset for electron induced reaction is found to be at about approximately 13 eV. The mechanisms may involve NH radicals interaction with CH(3)COOD molecules. Then glycine formation does not imply any displacement of reactants, so that it involves only NH(3) and CH(3)COOD neighboring molecules.