Aromatic self-assembled monolayers (SAMs) can be used as negative tone electron resists in functional surface lithographic fabrication. A dense and resistant molecular network is obtained under electron irradiation through the formation of a cross-linked network. The elementary processes and possible mechanisms involved were investigated through the response of a model aromatic SAM, p-terphenylthiol SAM, to low-energy electron (0-10 eV) irradiation. Energy loss spectra as well as vibrational excitation functions were measured using High Resolution Electron Energy Loss Spectroscopy (HREELS). A resonant electron attachment process was identified around 6 eV through associated enhanced excitation probability of the CH stretching modes ν(CH)(ph) at 378 meV. Electron irradiation at 6 eV was observed to induce a peak around 367 meV in the energy loss spectra, attributed to the formation of sp(3)-hybridized CHx groups within the SAM. This partial loss of aromaticity is interpreted to be the result of resonance formation, which relaxes by reorganization and/or CH bond dissociation mechanisms followed by radical chain reactions. These processes may also account for cross-linking induced by electron irradiation of aromatic SAMs in general.
Aromatic self-assembled monolayers (SAMs) can serve as platforms for development of supramolecular assemblies driven by surface templates. For many applications, electron processing is used to locally reinforce the layer. To achieve better control of the irradiation step, chemical transformations induced by electron impact at 50 eV of terphenylthiol SAMs are studied, with these SAMs serving as model aromatic SAMs. High-resolution electron energy loss spectroscopy (HREELS) and electron-stimulated desorption (ESD) of neutral fragment measurements are combined to investigate electron-induced chemical transformation of the layer. The decrease of the CH stretching HREELS signature is mainly attributed to dehydrogenation, without a noticeable hybridization change of the hydrogenated carbon centers. Its evolution as a function of the irradiation dose gives an estimate of the effective hydrogen content loss cross-section, σ = 2.7-4.7 × 10(-17) cm(2). Electron impact ionization is the major primary mechanism involved, with the impact electronic excitation contributing only marginally. Therefore, special attention is given to the contribution of the low-energy secondary electrons to the induced chemistry. The effective cross-section related to dissociative secondary electron attachment at 6 eV is estimated to be 1 order of magnitude smaller. The 1 eV electrons do not induce significant chemical modification for a 2.5 mC cm(-2) dose, excluding their contribution.
Low-energy electron induced degradation of a model self-assembled monolayer (SAM) of acid terminated alkanethiol was studied under ultra-high vacuum (UHV) conditions at room and low (~40 K) temperatures. Low-energy electron induced chemical modifications of 11-mercaptoundecanoic acid (MUA, HS-(CH2)10-COOH) SAMs deposited on gold were probed in situ as a function of the irradiation energy (<11 eV) by combining two complementary techniques: High Resolution Electron Energy Loss Spectroscopy (HREELS), a surface sensitive vibrational spectroscopy technique, and Electron Stimulated Desorption (ESD) analysis of neutral fragments. The SAM's terminal functions were observed to be selectively damaged at around 1 eV by a resonant electron attachment mechanism, observed to decay by CO, CO2 and H2O formation and desorption. CO2 and H2O were also directly identified at low temperature by vibrational analysis of the irradiated SAMs. At higher irradiation energy, both terminal functions and spacer alkyl chains are damaged upon electron irradiation, by resonant and non-resonant processes.
Low energy electron scattering on terphenylthiol (TPT, HS-(C6H4)2-C6H5) self-assembled monolayers (SAMs) deposited onto gold was investigated using high resolution electron energy loss spectroscopy (HREELS) by recording specular elastic and inelastic excitation functions. The electron elastic reflectivity could be directly compared to the sample density-of-states (DOS) above vacuum level. A high reflectivity region was observed in the range 7.2-8.6 eV. Inelastic excitation functions were studied to get insights into the mechanisms involved in the excitation of a selection of vibrational modes (dipolar and impact scattering). In particular, a resonant mechanism was observed in the excitation of the stretching mode ν(CC) at 196 meV. The purely resonant contribution to the electron-induced excitation of the stretching modes ν(CH) (379 meV) could be extracted from the overtone excitation. It is located at 7.2 eV above the vacuum level and is characterized by a width of 3.4 eV.
Water molecules were used to probe the physical and chemical properties of a model hydrophilic organic organized layer. To this end, HO adsorption on mercaptoundecanoic acid self-assembled monolayers (SAMs) was investigated at the molecular level under ultra-high vacuum by high resolution electron energy loss spectroscopy (HREELS), through the sensitivity of the water OH stretching modes to the molecular environment. The water interfacial layer formation and structure were studied upon deposition at 28 K. A direct sensitive quantification in the submonolayer regime (10-80% of completion) was achieved by the sole measurement of the OH stretching mode frequencies, and the dominant basic (-COO)/acidic (-COOH) forms of the terminal functions could be probed. The surface densities of the water interfacial layer and the SAM terminal functions were measured independently, and demonstrated to be comparable. This means that the SAM terminal functions provided anchors for water adsorption through two hydrogen bonds and that the SAM acted as a template even at 28 K. Upon annealing at 110 K, the water molecules were observed to form clusters of higher molecular density, dewetting the supporting substrate. Finally, the vanishing of the supporting substrate vibrational signature, due to the masking effect by the deposited water layer, was used to estimate the depth probed by HREELS through water layers to be 11 ± 2 Å.
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