Abstract. We developed a micromachining process for the fabrication of highly sensitive capacitor probes to be used for displacement measurement of an atomic force cantilever. The capacitive structure consists of two adjacent single-crystal silicon beams, one carrying a sharp tip for the force interaction, the other being the counter-electrode. The air gap of 1.5 pm separating the two electrodes is obtained by removal of the oxide in between by selective etching. The capacitance has a typical value of -0.2 pF. Forces acting on the tip induce a bending of the cantilever and change the caDacitance which can be detected bv electronic circuits.

Monocrystallme slhcon canttlevers with Integrated sdlcon tips for scannmg force mlcroscopy are fabncated by means of mlcromachmmg techmques Theorettcal conslderatlons mcludmg fimte element modelhng have been carried out m order to find a smtable shape and dlmenslons according to the mechanical requirements Several different cantilever designs have been fabricated a simple beam with various cross se&Ions as well as a folded meander shape with square cross section Special attention has been paid to the apphcatlon of these sdlcon microprobes to measure friction Moreover, high-aspect-ratio slhcon tips wtth vanable geometries are presented and their mtegratlon onto cantilevers IS demonstrated Finally, the fabrication of an array of such microprobes IS described, which enables multiple parallel or serial surface profihng to be achieved These Integrated mlcromachmed cantilevers have been successfully applied m standard atomic force microscope measurement systems

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