Plasmonic color filters in mass production have been restricted from current fabrication technology, which impede their applications. Soft-X-ray interference lithography (XIL) has recently generated considerable interest as a newly developed technique for the production of periodic nano-structures with resolution theoretically below 4 nm. Here we ameliorate XIL by adding an order sorting aperture and designing the light path properly to achieve perfect-stitching nano-patterns and fast fabrication of large-area color filters. The fill factor of nanostructures prepared on ultrathin Ag films can largely affect the transmission minimum of plasmonic color filters. By changing the fill factor, the color can be controlled flexibly, improving the utilization efficiency of the mask in XIL simultaneously. The calculated data agree well with the experimental results. Finally, an underlying mechanism has been uncovered after systematically analyzing the localized surface plasmon polaritons (LSPPs) coupling in electric field distribution.
A band-reject filter working in a near-infrared regime employing a bilayer Ag metasurface was demonstrated numerically and experimentally. This band-reject filter exhibited a broad rejection band (more than 500 nm), simple structure (including an ultrathin metal film, a dielectric layer, and substrate), and high tunability in the near-infrared spectral region, superior to previously reported filters with band-reject features. Simulations of optical reflection spectra under different conditions were carried out and revealed that the filtering behavior strongly depends on structural parameters. Three band-reject filters were experimentally fabricated and proved to be in good agreement with simulations.
Applications of metallic glass thin films (MGTFs) in the optical area have seldom been reported. We successfully design and fabricate a broadband and durable absorber with MGTFs. It is found that the absorber, with a total thickness of only ∼230 nm smaller than the light wavelength, exhibits excellent performance, that is, an average absorption of >90% from the visible to the near-infrared range (500−1300 nm). This is of significance for the optical application of MGTFs with the potential for large-scale fabrication using superplastic deformation in the supercooled liquid region of MGTFs.
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