The results of the DC magnetron sputtering of copper thin films with different parameters of deposition are presented. The main aim of studies was to determine the influence of current value, time of deposition and target-substrate distance on morphology and grain size of obtained copper thin films. The effects of film's thickness on the resistivity of copper thin films were investigated. The influence of parameters on the rate of deposition was also determined. The possibility of application of resulting films for contact surface in electronic components was discussed. The morphology was characterized by AFM method, the size of Cu deposited grains was calculated using Scherrer's method. The WDXRF method was used for estimate of thickness of sputtered films. The resistivity of obtained films was measured using four probe method.Keywords: DC magnetron sputtering, Cu films, electronic contact W pracy przedstawiono wyniki badań nad wpływem parametrów napylania magnetronowego cienkich warstw Cu na ich własności. Głównym celem przeprowadzonych badań było określenie wpływu natężenia prądu, czasu osadzania, odległości pomiędzy targetem a napylaną powierzchnią na wielkość ziarna oraz morfologię cienkich warstw. Przeprowadzono również badania nad wpływem grubości warstwy na jej opór właściwy. Omówiona została możliwość stosowania warstw nanoszonych tą metodą w przemyśle elektronicznym. Morfologię otrzymanych warstw charakteryzowano przy użyciu mikroskopu AFM. Wielkość ziarna oszacowana została na podstawie wzoru Scherrera. Grubość warstw wyznaczono techniką WDXRF. Do pomiarów oporu właściwego wykorzystano metodę pomiaru czteropunktowego.
The work comprises results of the studies of the mechanism and kinetics of the co-reduction of hexaaquacobalt(II) and pentaaquachlorocobalt(II) complexes in chloride solutions at pH = 3. The studies were preceded by the thermodynamic analysis of the electrolyte. Electrolyte stability was determined by UV – Vis absorbance measurements. Electrochemical examinations were performed by cyclic voltammetry (CV) combined with Electrochemical Quartz Crystal Microbalance (EQCM). The M/z values determined by electrogravimetric measurements indicated that the reduction process occurs in one step 2-electron reduction reaction. Although the low pH value (pH = 3) electrogravimetric tests also indicate the process of Co(OH)2 precipitation. Deposition of Co takes place only in the overpotential deposition range. The examined reactions were diffusion controlled. The diffusion coefficient of Co2+ ions was determined by using the Berzins – Delahay equation.
The article presents results of tests on electrodeposition in a magnetic field of Co-Mo and Co-Mo-C alloys characterised by low overvoltage of hydrogen evolution. Addition of molybdenum and carbon was to lower the values of overvoltage of hydrogen evolution on cobalt. The influence of a magnetic field of high intensity (1 -12 T) on the deposits composition, structure and morphology was determined. The deposition was conducted in a magnetic field of parallel orientation of the magnetic field forces lines in relation to the working electrode. Electrocatalytic properties of the obtained alloy coatings within the range of hydrogen evolution were tested in a concentrated solution of NaOH. The obtained alloys were analysed with the XRD method, their composition was tested with the WDXRF technique and they underwent observation applying scanning electron microscopy (SEM). The comparison of electrocatalytic properties of Co-Mo alloys with properties of Co-Mo-C ones enabled determining the influence of carbon presence in cathodic deposits on the overvoltage value of hydrogen evolution on them.Keywords: hydrogen evolution, electrocatalytic properties, electrodeposition, Co-Mo alloys, Co-Mo-C alloys, magnetoelectrochemistry W artykule przedstawione zostały wyniki badań nad elektroosadzaniem w polu magnetycznym stopów Co-Mo oraz Co-Mo-C charakteryzujących się niskim nadnapięciem wydzielania wodoru. Dodatek molibdenu oraz węgla miałna celu obniżenie wartości nadnapięcia wydzielania wodoru na kobalcie. Określony zostałwpływ pola magnetycznego o wysokim natężeniu (1 -12 T) na skład, strukturę oraz morfologię osadów. Osadzanie prowadzone było w polu magnetycznym o równoległej orientacji linii siłpola magnetycznego względem elektrody pracującej. Właściwości elektrokatalityczne otrzymanych powłok stopowych w zakresie wydzielania wodoru badano w gorącym stężonym roztworze NaOH. Otrzymane stopy poddano analizie XRD, analizie składu z wykorzystaniem techniki WDXRF oraz obserwacjom z wykorzystaniem skaningowej mikroskopii elektronowej (SEM). Porównanie właściwości elektrokatalitycznych stopów Co-Mo z właściwościami stopów Co-Mo-C pozwoliło na określenie wpływu obecności węgla w osadach katodowych na wartość nadnapięcia wydzielania na nich wodoru.
Carbon addition to electrodeposited Co-Mo alloys was made to enhance electrolytic hydrogen evolution activity and to prevent open-circuit corrosion in 8 M NaOH at 90°C. Co-30 atom % Mo alloy showed the highest activity for hydrogen evolution among the binary Co-Mo alloys, but open-circuit immersion resulted in dissolution of molybdenum as molybdate, with a consequent decrease in the hydrogen evolution activity. Addition of carbon to electrodeposited Co-Mo alloys by adding lysine in the deposition electrolytes further enhanced hydrogen evolution activity and slowed dissolution of molybdenum during open-circuit immersion, although complete prevention of dissolution of molybdenum was not attained.
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