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A wind engineering research field laboratory, which consists of a full-scale low-rise building and two towers, has been constructed by Tongji University near Shanghai Pudong International Airport to study the characteristics of near-ground wind field and wind pressure on low-rise buildings. The full-scale building, whose roof pitch could be adjusted ranging from 0° to 30°, is 10 m in length, 6 m in width and 8 m in eave's height. It is employed to study the wind pressure on the gable roof of low-rise building with different roof pitches. This paper explicitly and concretely discusses the filed facility, data measurement system, data acquisition system, and tap location to provide references for related researchers. Besides, two pieces of time-histories of ten-minute-length wind pressures are analyzed at 0° and 20° roof pitches respectively to compare with those of a wind tunnel test on a rigid model of 1 : 30 scale. The results show that the tendency for the mean and fluctuating wind pressure distributions between the two kinds of tests is nearly similar.

Molybdenum (Mo) thin films are widely used as a back contact for CIGS-based solar cells. This paper determines the optimal settings for the sputtering parameters for an Mo thin film prepared on soda lime glass substrates, using direct current (dc) magnetron sputtering, with a metal Mo target, in an argon gas environment. A Taguchi method with an L9orthogonal array, the signal-to-noise ratio, and an analysis of variances is used to determine the performance characteristics of the coating operation. The main sputtering parameters, such as working pressure (mTorr), dc power (W), and substrate temperature (°C), are optimized with respect to the structural features, surface morphology, and electrical properties of the Mo films. An adhesive tape test is performed on each film to determine the adhesion strength of the films. The experimental results show that the working pressure has the dominant effect on electrical resistivity and reflectance. The intensity of the main peak (110) for the Mo film increases and the full width at half maximum decreases gradually as the sputtering power is increased. Additionally, the application of an Mo bilayer demonstrates good adherence and low resistivity.

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