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Bilayer antireflective coatings consisting of aluminium oxide Al 2 O 3 /MgF 2 and Al 2 O 3 /SiO 2 are presented in this paper. Oxide films were deposited by means of e-gun evaporation in vacuum of 5 × 10 −3 Pa in the presence of oxygen, and magnesium fluoride was prepared by thermal evaporation on heated optical lenses made from quartz glass (Corning HPFS). Substrate temperature was maintained at 250 • C during the deposition. Thickness and deposition rate were controlled with a thickness measuring system Inficon XTC/2. The experimental results of the optical measurements carried out during and after the deposition process have been presented. Physical thickness measurements were made during the deposition process and resulted in 44 nm/52 nm for Al 2 O 3 /MgF 2 and 44 nm/50 nm for Al 2 O 3 /SiO 2 system. Optimization was carried out for ultraviolet region with minimum of reflectance at 300 nm. The influence of post deposition annealing on the crystal structure was determined by X-ray measurements. In the range from ultraviolet to the beginning of visible region, the reflectance of both systems decreased and reached minimum at 290 nm. The value of reflectance at this point, for the coating Al 2 O 3 /MgF 2 was equal to R 290nm = 0.6 % and for Al 2 O 3 /SiO 2 R 290nm = 1.1 %. Despite the difference between these values both are sufficient for applications in the UV optical systems for medicine and UV laser technology.

This paper presents the results of investigations of optical scattering phenomena in porous silica films. SiO2 films were prepared by the sol-gel method and deposited on polished silicon wafers by the dip-coating technique. Fabricated films were studied using integrating sphere reflectometry, spectroscopic ellipsometry, atomic force microscopy, scanning electron microscopy, and angular resolve scattering. The spectral characteristics of the refractive and extinction indices and scattering extinction coefficients are presented. Additionally, the depolarization of reflected beam from samples was measured. The tested films were characterized by a thickness of 500 to 900 nm, a porosity of 50%, and refractive indices of less than 1.24. The observed depolarization of light reflected from SiO2 films resulted from surface and bulk scattering. This phenomenon resulted from the presence of surface and closed pores located in the bulk of SiO2 film.

Deposition technology of the three layers antireflective coatings consists of hafnium compound are presented in this paper. Oxide films were deposited by means of e-gun evaporation in vacuum of 5x10 -5 mbar in presence of oxygen and fluoride films by thermal evaporation. Substrate temperature was 250 o C. Coatings were deposited onto optical lenses made from quartz glass (Corning HPFS). Thickness and deposition rate were controlled by thickness measuring system Inficon XTC/2. Simulations leading to optimization of thickness and experimental results of optical measurements carried during and after deposition process were presented. Physical thickness measurements were made during deposition process and were equal to 43 nm/74 nm/51 nm for Al 2 O 3 / HfO 2 / MgF 2 respectively. Optimization was carried out for ultraviolet region from 230nm to the beginning of visible region 400 nm. In this region the average reflectance of the antireflective coating was less than 0.5% in the whole range of application.

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