This work analyzes the effect of various gate structures on the DC and radio frequency (RF) performance of AlGaN/GaN high-electron mobility transistors (HEMTs). AlGaN/GaN HEMT devices with a 3 μm drain-to-source spacing, 125 μm gate width and 0.3 μm gate length in various gate structures were fabricated to achieve the desired frequency response with a robust, high yield, and repeatable process. The maximum drain current (I DS , max), maximum DC transconductance (g m), pinch-off voltage (V th), current-gain cutoff frequency (f T), maximum oscillation frequency (f max), and RF characteristics of the devices in terms of the small-signal gain and RF output power (P out) at 8 GHz were investigated. The results showed that the output power is increased by 1 dB when the gate structure is changed from field plate to gamma gate. The V th , g m , f T and f max values are maximized when the thickness of the passivation layer between the gate foot and the gate head is minimized. It is shown that the I DS,max is decreased and P out is increased when the gate recess etching process is performed.
An X-Band Monolithic Microwave Integrated Circuit (MMIC) High Power Amplifier (HPA) with coplanar waveguide (CPW) based on AlGaN/GaN on SiC technology is presented in this paper. Coplanar waveguide technology (CPW) is chosen for the simplicity and reduced cost of fabrication since CPW process has no via. High Electron Mobility Transistors (HEMTs) are matched for the 8 GHz-8.4GHz frequency band for maximum output power. The Amplifier has a small signal gain over 10 dB, output power of 36.5dBm at 1 dB gain compression point (P1dB) and 40% power added efficiency (PAE) at (P1dB) in the desired frequency band (8 GHz-8.4 GHz) with Vds = 30V.
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