TiO2/ZnO nanostructured thin films were grown using sol-gel route. The nanostructured thin films were deposited by dip coating method on glass substrates and calcined at different temperatures (400°C, 500°C, and 600°C). The thin films were characterized using X-Ray Diffraction method (XRD), Atomic Force Microscope (AFM), and Ultraviolet Visible Spectroscopy (UV-Vis). The XRD pattern showed that the crystallinity of the calcined thin films had improved when the calcination temperature was increased. According to AFM observation and analysis, surface roughness of the thin films controllable via growth condition. While the transmittance percentage of ultraviolet by Titanium Dioxide (TiO2) thin films through UV-Vis could be improved by combination with Zinc Oxide (ZnO). The percentage of transmittance by TiO2/ZnO nanostructured thin films continue to improve as the calcination temperature were increased.
Thin film has been extensively study due to better structural, surface morphology, and optical properties. The combination of two materials will enhance the properties of thin film. In this study, TiO2/ZnO thin films were deposited on glass substrates via sol-gel method. TiO2 acts as pre-deposited thin film with calcination temperatures at 400 °C, 500 °C, and 600 °C. The post-deposition of TiO2/ZnO thin films were calcined at 500 °C and 600 °C. TiO2 sol-gel was synthesis from titanium (IV) butoxide and butanol as the precursor, while ZnO sol-gel was synthesis from zinc acetate dehydrate and isopropanol as the precursor. The TiO2/ZnO thin films were characterized by X-ray diffraction (XRD), atomic force microscope (AFM), and ultraviolet visible spectroscopy (UV-Vis). The effect of calcination temperature and pre-deposited TiO2 thin films show difference results of bilayer thin films. The XRD analysis shows all TiO2/ZnO thin films growth with TiO2 anatase crystalline phase at orientation (1 0 1) and ZnO zincite phase at orientation (1 0 1). The structural properties of TiO2/ZnO thin films were improved by controlling the calcination temperature. Based on AFM analysis, the RMS value for TiO2/ZnO decreases as the calcination temperature increased. The compacted and dense surface roughness were controlled by the temperature. Meanwhile, the percentage of thin film ultraviolet transmittance can be enhanced with combination of two materials, TiO2 and ZnO. Therefore, the pre-deposited layer of thin film with influenced by calcination temperature will improve the crystallinity, surface morphology, and optical properties of TiO2/ZnO thin films.
Thin film is a thin material that is resulting from the condensation of species through the deposition of atoms on the substrate. Thin films are usually used in the production of electronic devices, optical coatings, solar cells, and for decorative items. The bilayer of TiO2/ZnO and ZnO TiO2 thin films have some advantages such as can enhance the surface state and surface atomic mobility, which are useful for improving the photocatalytic activity. The motivation to a used double layer of ZnO and TiO2 is to enhance the properties and photocatalytic activity using the different deposition temperature between the layers. The structural of ZnO/TiO2 thin films were studied using X-Ray diffraction (XRD). Field Emission Scanning Electron Microscope (FESEM) was used to determine the surface morphology of ZnO/TiO2 thin films. The photocatalytic activity of ZnO/TiO2 thin films was analysed using the photodegradation of methylene blue (MB) solution. The XRD analysis revealed that highest anatase crystalline phase for TiO2 growth with orientation (1 0 1), while the ZnO crystal phase, zincite occurred at the highest intensity with (1 0 1) orientation.. The bilayer TiO2/ZnO thin film had the highest reaction rate, K, which is 0.0972 h-1 for photocatalytic activity. The characteristics of bilayer TiO2/ZnO and ZnO/TiO2 thin-film is strongly influenced by the calcination temperature and the presence and combination between the two types of materials.
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