The mechanism of water photooxidation reaction at atomically flat n-TiO(2) (rutile) surfaces was investigated in aqueous solutions of various pH values, using photoluminescence (PL) measurements. The PL bands, which peaked at around 810 and 840 nm for the (110) and (100) surfaces, respectively, were assigned to radiative transitions between conduction-band electrons and surface-trapped holes (STH), [Ti-O=Ti(2)](s)+, formed at triply coordinated (normal) O atoms at the surface lattice. The PL intensity (I(PL)) decreased stepwise with increasing solution pH, namely, it sharply decreased at around pH 4, near the point of zero charge of TiO(2) (about 5), and then rapidly decreased to zero near pH 13. The first sharp decrease around pH 4 is attributed to the increased rate of nucleophilic attack of a water molecule to a hole at a site of surface bridging oxygen (Ti-O-Ti), the density of which increases with increasing pH. The nucleophilic attack is regarded as the main initiating step of the water oxidation reaction in low and intermediate pH. The high PL intensity at low pH is ascribed to slow nucleophilic attack owing to a very low density of Ti-O-Ti by its protonation at the low pH. The second sharp decrease near pH 13 is attributed to formation of surface anionic species like Ti-O- which can be readily oxidized by photogenerated holes. Interrelations between reaction intermediates proposed in this work and those reported by time-resolved laser spectroscopy are discussed.

The success in preparing atomically smooth and stable (110) and (100) TiO2 (rutile) surfaces, combined with in situ photoluminescence (PL) and photocurrent measurements as well as atomic force microscopic (AFM) inspection, has enabled us to make systematic studies on molecular mechanisms of oxygen photoevolution and related processes on TiO2 (rutile), which are important for solar water splitting and photocatalytic environmental cleaning. The studies have revealed that various surface processes and properties, such as the flat-band potential (Ufb), the spectrum and intensity of the PL from a precursor of the oxygen photoevolution reaction, and photoinduced surface roughening, have all strong dependences on the atomic-level structure of the TiO2 surface. Importantly, all the results have been explained on the basis of our recently proposed new mechanism that the oxygen photoevolution reaction is initiated by a nucleophilic attack of an H2O molecule to a surface-trapped hole, thus giving confirmative evidence to it. The molecular mechanisms for photoinduced primary processes at the TiO2 surface, clarified in the present work, will provide a typical model for photoreactions on metal oxides in contact with aqueous solutions.

Essentially atomically smooth (100) and (110) n-TiO(2) (rutile) surfaces were prepared by immersion of commercially available single-crystal wafers in 20% HF, followed by annealing at 600 degrees C in air. The obtained surfaces were stable in aqueous solutions of pH 1-13, showing no change in the surface morphology on an atomic level, contrary to atomically flat surfaces prepared by ion sputtering and annealing under UHV. The success in preparation of the atomically smooth and stable n-TiO(2) surfaces enabled us to reveal clear crystal-face dependences of the surface band edges and hole reactivity in aqueous solutions.