We report, for the first time to our knowledge, experimental demonstration of wave-front analysis via the Hartmann technique in the extreme ultraviolet range. The reference wave front needed to calibrate the sensor was generated by spatially filtering a focused undulator beam with 1.7- and 0.6-microm-diameter pinholes. To fully characterize the sensor, accuracy and sensitivity measurements were performed. The incident beam's wavelength was varied from 7 to 25 nm. Measurements of accuracy better than lambdaEUV/120 (0.11 nm) were obtained at lambdaEUV = 13.4 nm. The aberrations introduced by an additional thin mirror, as well as wave front of the spatially unfiltered incident beam, were also measured.
Optical constants of amorphous have been calculated by the Kramers-Kronig analysis in the continuous spectral region including , O K and Si K absorption edges from the reflection spectra measured using synchrotron radiation. It is the first experiment carried out in such a wide energy region with the same sample. It has been found that for extrapolation of the experimental curve in the high energy region, where the photon energy exceeds the ionization potential of the Si K edge, the relation can be used for energies such that at small grazing angles.
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