Low-temperature growth, as well as the transfer free growth on substrates, is the major concern of graphene research for its practical applications. Here we propose a simple method to achieve the transfer free graphene growth on SiO2 covered Si (SiO2/Si) substrate at 250 °C based on a solid-liquid-solid reaction. The key to this approach is the catalyst metal, which is not popular for graphene growth by chemical vapor deposition. A catalyst metal film of 500 nm thick was deposited onto an amorphous C (50 nm thick) coated SiO2/Si substrate. The sample was then annealed at 250 °C under vacuum condition. Raman spectra measured after the removal of the catalyst by chemical etching showed intense G and 2D peaks together with a small D and intense SiO2 related peaks, confirming the transfer free growth of multilayer graphene on SiO2/Si. The domain size of the graphene confirmed by optical microscope and atomic force microscope was about 5 μm in an average. Thus, this approach will open up a new route for transfer free graphene growth at low temperatures.
Synthesis of hexagonal boron nitride (hBN) crystals with a controlled morphology is a major challenge due to various kinetic and thermodynamic factors at the edge. Supplying BN building blocks by heating precursor ammonia borane at a temperature of 90 °C produced triangular crystals, whereas, at higher heating (130 °C), hBN crystals with a hexagonal morphology were observed. The shape of crystals could also be modulated from hexagonal to triangular under a continuous reduced supply of BN building blocks. We attributed these phenomena to a different growth mechanism dependent on the concentration of BN radicals in the growth region. With a low supply of BN building blocks, crystal growth is the edge attachment limited, producing triangles, whereas, under higher concentration of BN building blocks, crystal growth is limited by diffusion producing hexagons. The presence of alternating B and N terminated vertices in hexagonal hBN crystals offers the possibility of hBN/graphene in-plane heterostructure synthesis with B-C and N-C bonding at the interface, which is not possible with N terminated triangular crystals. Supplying the controlled amount of BN building blocks to synthesize triangular and hexagonal crystals and modulation from hexagons to triangles is a major achievement (in the present work) due to single parameter control over the experiment.
The spontaneous graphitization for C films containing Ni NPs was attributed mainly to the increased solubility for metallic Ni NPs, and was enhanced at the deposition temperature of 50 °C.
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