Roll-to-roll UV nanoimprint lithography has superior advantages for high-throughput manufacturing of micro- or nano-structures on flexible polymer foils with various geometries and configurations.
The UV-nanoimprint lithography(UV-NIL) fabrication of a novel network of micron-sized channels, forming an open channel microfluidic system is described. Details about the complete manufacturing process, from mastering to fabrication in small batches and in high throughput with up to 1200 micro titer plates per hour is presented. Deep insight into the evaluation of a suitable UV-curable material, mr-UVCur26SF is given, presenting cytotoxic evaluation, cell compatibility tests and finally a neuronal assay. The results indicate how the given pattern, in combination with the resist, paves the way to faster, cheaper, and more reliable drug screening.
The ongoing advancement of lithographic manufacturing in micro- and nanopatterning rely on the commercial availability of innovative photoresists, polymers and photopolymers as well as complementary process chemicals: This allows to enhance current micro- and nanofabrication technologies by increasing the overall pattern complexity or general process simplicity. In this contribution, we demonstrate that material innovations have a significant part in enhancing micro- and nanofabrication by outperforming generic photoresists through cross-functionality as it is increasingly required in ever growing pattern complexity (e.g. advanced mix-and-match methods) or when additional material features are set by the final application.
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