Photodarkening is recognized as a potentially important limiting factor on the lifetime and reliability of many Yb-doped fiber lasers and amplifiers. In particular, a photodarkening process attributed to the formation of photoinduced structural transformations can induce excess loss in the doped glass core of the fiber, resulting in reduced output power efficiency. Yet, quantifiable measurement techniques of this phenomenon have been scarce in the literature to date. Here we present a fast, simple and repeatable method to measure and compare the photodarkening rate caused by the formation of photoinduced structural transformations from Yb-doped single-mode fibers. The method relies on quantifying observations of transmission changes at visible wavelengths as an indicative measure of photodarkening at the signal wavelengths. Preliminary measurement results are presented supporting the utility of the technique for benchmarking the photodarkening behavior of different Yb-doped fibers.
Yb-doped fibers are widely used in laser applications requiring high average output powers and high-peak-power pulse amplification. Photodarkening (PD) is recognized as one limiting factor in these fibers when pumped with high-intensity radiation. We describe an approach for performing quantitative PD studies of fibers, and we present measurements of the rate of PD in Yb-doped single-mode fibers with varying inversion levels. The method is applicable to large-mode-area fibers. We observed a seventh-order dependence of the PD rate on the excited-state Yb concentration for two different fibers; this result implies that PD of a Yb-doped fiber source fabricated using a particular fiber will be strongly dependent on the configuration of the device.
At present flexible electronic devices are under extensive development and, among them, flexible organic light-emitting diode displays are the closest to a large market deployment. One of the remaining unsolved challenges is high throughput production of impermeable flexible transparent barrier layers that protect sensitive light-emitting materials against ambient moisture. The present studies deal with the adaptation of the atomic layer deposition (ALD) process to high-throughput roll-to-roll production using the spatial ALD concept. We report the development of such a process for the deposition of 20 nm thickness Al2O3 diffusion barrier layers on 500 mm wide polymer webs. The process uses trimethylaluminum and water as precursors at a substrate temperature of 105 °C. The observation of self-limiting film growth behavior and uniformity of thickness confirms the ALD growth mechanism. Water vapor transmission rates for 20 nm Al2O3 films deposited on polyethylene naphthalate (PEN) substrates were measured as a function of substrate residence time, that is, time of exposure of the substrate to one precursor zone. Moisture permeation levels measured at 38 °C/90% relative humidity by coulometric isostatic–isobaric method were below the detection limit of the instrument (<5 × 10−4 g/m2 day) for films coated at web moving speed of 0.25 m/min. Measurements using the Ca test indicated water vapor transmission rates ∼5 × 10−6 g/m2 day. Optical measurements on the coated web showed minimum transmission of 80% in the visible range that is the same as the original PEN substrate.
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