Ferroelectric BiFeO3 thin films have been deposited on Pt/TiO2/SiO2/Si substrate by pulsed-laser deposition. From the X-ray diffraction analysis, the BiFeO3 thin film consists of perovskite single-phase, and the crystal structure shows the tetragonal structure (c/a = 1.018) with a space group P4m
m. It is obtained that the BiFeO3 thin film shows a well-saturated remarkably giant saturation polarization of 158 µC/cm2 and a remanent polarization of 146 µC/cm2 for a maximum applied voltage of 20 V at 90 K. These values of polarization are largest ever-measured in ferroelectrics.
Following our experimental report of a giant ferroelectric polarization in the region of 150 µC cm(-2) in BiFeO(3) (BFO) films, we have performed first-principles calculations based on the local density approximation to density functional theory, aiming to clarify its mechanism. Upon optimization of lattice constants we have shown that the natural tetragonal structure of BFO has a giant tetragonality ratio of 1.26 and large ionic off-centring. Experimentally this structure has been detected in BFO films deposited on La-doped SrTiO(3) substrates. The spontaneous polarization calculated ab initio for this structure is 143.5 µC cm(-2), in agreement with the remanent polarization of hysteresis loops measured at 90 K. These results suggest that the giant polarization of our BFO films may occur upon stabilization of the optimal tetragonal phase with giant tetragonality. Future experimental effort aiming to routinely obtain such values of spontaneous polarization should concentrate on how to isolate this phase without compromising the insulating and switching properties of BFO.
BiFeO 3 thin films have been prepared on Pt∕TiO2∕SiO2∕Si substrates under various oxygen pressures of 0.15–0.005Torr at a temperature of 450°C by pulsed-laser deposition. The effects of deposition pressure on their crystal structure and multiferroic properties have been investigated at room temperature. X-ray diffraction analysis (θ-2θ scans and 2-dimensional scans) shows that the BiFeO3 thin films consist of perovskite single phase with tetragonal crystal structure and space group P4mm. The c-axis lattice constant decreases (4.062–4.006Å) and c∕a ratio of the films decreases from 1.032 to 1.014 with a decrease in the oxygen pressure. The surface roughness and grain size of the films depend dramatically on oxygen pressures. The dielectric constant of the films decreases with decreasing oxygen pressure. The film deposited at 0.05Torr shows a stable current density and well-saturated hysteresis loop with twice the remanent polarization (2Pr) of 136μC∕cm2 and coercive field (2Ec) of 109kV∕cm. The BiFeO3 thin films also show the saturated weak ferromagnetic hysteresis loops with a small remanent magnetization.
Ferroelectric BiFeO3 thin films have been prepared on Pt/TiO2/SiO2/Si substrates in various oxygen pressures of 0.001–0.1 Torr at a temperature as low as 450 °C by pulsed-laser deposition. The crystallinity of the films was studied by x-ray diffraction. X-ray photoelectron spectroscopy showed that the films have a single phase of perovskite BiFeO3. The BiFeO3 thin films deposited at 0.01–0.1 Torr show good current-density–applied-voltage characteristics. It is obtained from polarization–electric-field characterization that 2Pr is about 71.3 μC/cm2 and 2Ec is 125 kV/cm. Stable current density and saturated ferroelectric hysteresis loop have been observed in BiFeO3 thin films.
Ferroelectric BiFeO3 thin films were grown on Pt∕TiO2∕SiO2∕Si substrates by pulsed-laser deposition. From the x-ray diffraction analysis, the BiFeO3 thin films consist of perovskite single phase, and the crystal structure shows the tetragonal structure with a space group P4mm. The BiFeO3 thin films show enhanced electrical properties with low leakage current density value of ∼10−4A∕cm2 at a maximum applied voltage of 31V. This enhanced electrical resistivity allowed the authors to obtain giant ferroelectric polarization values such as saturation polarizations of 110 and 166μC∕cm2 at room temperature and 80K, respectively.
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