The controlled creation of defects in silicon carbide represents a major challenge. A wellknown and efficient tool for defect creation in dielectric materials is the irradiation with swift (E kin Z500 keV/amu) heavy ions, which deposit a significant amount of their kinetic energy into the electronic system. However, in the case of silicon carbide, a significant defect creation by individual ions could hitherto not be achieved. Here we present experimental evidence that silicon carbide surfaces can be modified by individual swift heavy ions with an energy well below the proposed threshold if the irradiation takes place under oblique angles. Depending on the angle of incidence, these grooves can span several hundreds of nanometres. We show that our experimental data are fully compatible with the assumption that each ion induces the sublimation of silicon atoms along its trajectory, resulting in narrow graphitic grooves in the silicon carbide matrix.

We report on the structural investigation of self-organized periodic microstructures (ripples) generated in Si(100) targets after multishot irradiation by approximately 100-fs to 800-nm laser pulses at intensities near the single shot ablation threshold. Inspection by surface sensitive microscopy, e.g., atomic force microscopy (AFM) or scanning electron microscopy (SEM), and conventional and high-resolution transmission electron microscopy reveal complex structural modifications upon interaction with the laser: even well outside the ablated area, the target surface exhibits fine ripple-like undulations, consisting of alternating crystalline and amorphous silicon. Inside the heavily modified area, amorphous silicon is found only in the valleys but not on the crests which, instead, consist of highly distorted crystalline phases, rich in defects.

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Extremely early phases of the catastrophic optical damage (COD) process in 808-nm emitting GaAs/Al 0 .35 Ga 0 .65 As high-power diode lasers are prepared by the application of short single current pulses. Typical energy entries during these pulses are on the order of 100 nJ within several 100 ns. The resulting defect pattern is investigated by high-resolution microscopy. The root of the COD is found to be located at the waveguide of the laser structure. Analysis of material composition modifications as a result of early COD phase points to melting being involved in the process. During recrystallization, an Al-rich pattern is formed that encloses a volume of a few cube micron of severely damaged material.

Optical properties of aluminium nanoparticles deposited on glass substrates are investigated. Laser interference lithography allows a quick deposition of regular, highly periodic arrays of nanostructures with different sizes and distances in order to investigate the shift of the surface plasmon resonance for, e.g., photovoltaic, plasmonic or photonic applications. The variation of the diameter of cylindrical Al nanoparticles exhibits a nearly linear shift of the surface plasmon resonance between 400 nm and 950 nm that is independent from the polarization vector of the incident light. Furthermore, particles with quadratic or elliptic base areas are presented exhibiting more complex and polarization vector dependent transmission spectra.