We have previously demonstrated (a depth of focus of several millimeters in masked ion beam lithography (MIBL). This work illustrates the use of this capability to pattern concave and convex spherical substrates 25 mm in diameter and 5.5 mm deep. Features as small as 175nm were printed across a convex substrate with 75 keV He + ions where the mask-to-wafer gap varied from 1 mm on the center to 6.5 mm on the edge. We also demonstrate, for the first time, the fabrication of 800 nm features in a 4 nm thick Cr coating by masked ion beam direct structuring (MIBS), where 45 keV Argon ions sputter the film through a stencil mask. We demonstrate electronic adjustment of the radial beam profile of the incident ion beam to compensate for the continuously changing angle between the beam and the spherical substrate, thus achieving constant exposure dose (for MIBL) or sputtering rate (for MIBS) a 50 x 50 mm 2 field.
An innovative combustion system, the so‐called low‐emission combustion system (LEVS), with integrated exhaust gas treatment measurement for thermal utilization of biomass‐fueled boilers is presented. It comprises an intelligently controlled three‐fan combustion air supply and exhaust gas system, a cyclone combustion chamber, and packed‐technology, ensuring high combustion efficiency and stable low‐emission combustion. The technology was tested by preliminary experiments for various application scenarios of biomass, and the current environmental and health‐related aspects were also evaluated. The relevant emission reduction through the system results from improved combustion in critical operating phases, in which the total emissions produced in conventional gasification boilers are drastically reduced. A minimum increase of the boiler efficiency of 15 % in practice with corresponding fuel and CO2 savings can be guaranteed.
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