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We report measurements of the topography of a gold film deposited on a mica substrate using scanning tunneling microscope ͑STM͒, and measurements of the conductivity of the film performed between 4 and 300 K. From images obtained with the STM running in air in the constant current mode of a gold sample 70-nm-thick deposited under UHV on a mica substrate preheated to 300°C, we compute the average autocorrelation function ͑ACF͒ that characterizes the surface of the film in the scale of 10ϫ10 nm 2 , and determine by least-squares fitting the parameters ␦ ͑rms. amplitude͒ and ͑lateral correlation length͒ corresponding to an exponential that best describes the average ACF data. Using an exponential representation of the ACF, the parameters ␦ and determined from STM measurements, and a modified version of the theory of Sheng, Xing, and Wang recently proposed ͓R. C. Munoz et al., J. Phys.: Condens. Matter 11, L299 ͑1999͔͒, we calculate the temperature dependence of the bulk resistivity 0 (T) and of the increase in resistivity ⌬(T)ϭ(T)Ϫ 0 (T) induced by electron-surface scattering on this film. The result is that 1Ϫ/ 0 ϭ1Ϫ 0 /ϭ⌬/ amounts to about 2.6% at 300 K, and increases linearly with increasing mean free path, to about 10.5% at 4 K. The increase in resitivity ⌬ turns out to be weakly temperature dependent.