Samarium-doped ceria (SDC) and gadolinium-doped ceria (GDC) thin films were formed by e-beam vapor deposition on SiO2 substrate, changing the deposition rate and substrate temperature during the deposition. X-ray diffraction (XRD), scanning electron microscopy (SEM), and energy dispersive X-Ray spectrometry (EDS) were employed in order to investigate the structure ad morphology of the films. A single Raman peak describing the structure of undoped CeO2 was observed at a frequency of 466 cm−1. Doping of cerium oxide with rare-earth elements shifted the peak to lower frequencies (for Sm—462 cm−1). This shift occurs due to the increased number of oxygen vacancies in doped cerium oxide and it depends on the size and concentration factor of the dopant. It was found that wavenumbers and their intensity differed for the investigated samples, even though the peaks resembled each other in shape. The indicated bands for doped ceria originated as a result of the Raman regime (F2g) of fluorite dioxide associated with the space group (Fm3m). The observed peak‘s position shifting to a lower frequency range demonstrates the symmetric vibrations of oxygen ions around Ce4+ ions in octahedra CeO8. Raman shift to the lower frequencies for the doped samples has two reasons: an increase in oxygen vacancies caused by doping cerium oxide with rare-earth materials and the size factor, i.e., the change in frequency Δω associated with the change in the lattice constant Δa.

In this work, scandia-doped zirconia (ScSZ) and scandia–alumina co-doped zirconia (ScSZAl) thin films were prepared by electron beam vapor deposition. X-ray diffraction (XRD) results indicated a presence of ZrO2 cubic phase structure, yet Raman analysis revealed the existence of secondary tetragonal and rhombohedral phases. Thus, XRD measurements were supported by Raman spectroscopy in order to comprehensively analyze the structure of formed ScSZ and ScSZAl thin films. It was also found that Al dopant slows down the formation of the cubic phase. The impedance measurements affirmed the correlation of the amount of secondary phases with the conductivity results and nonlinear crystallite size dependence.

The morphology of aluminum co-doped scandium stabilized zirconia (ScAlSZ) thin films formed by e-beam deposition system was investigated experimentally and theoretically. The dependencies of surface roughness, and the films’ structure on deposition temperature and deposition rate were analyzed. It was shown experimentally that the dependence of the surface roughness on deposition temperature and deposition rate was not monotonic. Those dependencies were analyzed by mathematical modeling. The mathematical model includes the processes of phase separation, adsorption and diffusion process due to the film surface curvature. The impacts of substrate temperature, growth rate on surface roughness of thin films and lateral nanoparticle sizes are shown by the modeling results. Modeling showed that the roughness of the surface of grown films became higher in most cases as the substrate’s temperature rose, but the higher deposition rate resulted in lower surface roughness in most cases. The results obtained by simulations were compared to the relevant experimental data. The non-linear relationships between surface roughness of grown films and lateral size of nanoparticles were also shown by our modeling results, which suggested that the variation in the surface roughness depending on the substrate temperature and growth rate was related to the lateral size of nanoparticles.

Scandia alumina stabilized zirconia (ScAlSZ) thin films were deposited using e-beam evaporation, and the effects of deposition parameters on the structure and chemical composition were investigated. The analysis of thin films was carried out using Energy-dispersive X-ray spectroscopy (EDS), X-ray photoelectron spectroscopy (XPS), X-Ray Diffraction Analysis (XRD) and Raman spectroscopy methods. It was found that the chemical composition of ScAlSZ thin films was different from the chemical composition of the initial powder. Moreover, the Al concentration in thin films depends on the deposition rate, resulting in a lower concentration using a higher deposition rate. XPS analysis revealed that ZrOx, oxygen vacancies, high concentrations of Al2O3 and metallic Al exist in thin films and influence their structural properties. The crystallinity is higher when the concentration of Al is lower (higher deposition rate) and at higher substrate temperatures. Further, the amount of cubic phase is higher and the amount of tetragonal phase lower when using a higher deposition rate.

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