Ptychography, a scanning coherent diffraction imaging method, can produce a high-resolution reconstruction of a sample and, at the same time, of the illuminating beam. The emergence of vacuum ultraviolet and X-ray free electron lasers (FELs) has brought sources with unprecedented characteristics that enable X-ray ptychography with highly intense and ultra-fast short-wavelength pulses. However, the shot-to-shot pulse fluctuations typical for FEL pulses and particularly the partial spatial coherence of self-amplified spontaneous emission (SASE) FELs lead to numerical complexities in the ptychographic algorithms and ultimately restrict the application of ptychography at FELs. We present a general adaptive forward model for ptychography based on automatic differentiation, which is able to perform reconstructions even under these conditions. We applied this model to the first ptychography experiment at FLASH, the Free electron LASer in Hamburg, and obtained a high-resolution reconstruction of the sample as well as the complex wavefronts of individual FLASH pulses together with their coherence properties. This is not possible with more common ptychography algorithms.
Implementing the plasma-lasing potential for tabletop nano-imaging on across a hot plasma medium drives short-wavelength lasing, promising for ''turnkey'' nano-imaging setups. A systematic study of the illumination characteristics, combined with design-adapted objectives, is presented. It is shown how the ultimate nano-scale feature is dictated by either the diffraction-limited or the wavefront-limited resolution, which imposed a combined study of both the source and the optics. For nano-imaging, the spatial homogeneity of the illumination (spot noise) was shown as critical. Plasma-lasing from a triple grazingincidence pumping scheme compensated for the missing spot homogeneity in classical schemes. We demonstrate that a collimating mirror preconditions both the pointing stability and the divergence below half a mrad.
A Y/Mo multilayer coating, optimized for top reflectivity at λ=12 nm, has been nano-inspected after long-term operation at the in-house soft x-ray laser. The surface and optical inspections were complemented by electron microscopy on cross sections, prepared with focused ion beam technology. A factor of 2.5 loss of reflectivity in the exposed area (ca. 30% relative loss every 100 shots), with concomitant nanoscale photodamage and particle fallout, was found. The x-ray-laser-induced damage extended as deep as 250 nm beneath the surface and as wide as the millimeter spot size.
Laser-produced Ni-like plasmas are known as active media for extreme ultraviolet lasing, with the flexibility to two-color lasing. Two-color laser generation is very complex at accelerator facilities. In this work, plasma lasing at the 3d 9 4d 1 (J ¼ 0) ! 3d 9 4p 1 (J ¼ 1) (collisional-pumping process) and the 3d 9 4f 1 (J ¼ 1) ! 3d 9 4d 1 (J ¼ 1) (photo-pumping process) transitions is studied experimentally and computationally. Several key characteristics of collisional-and photo-pumping laser, such as divergence, pointing stability, and intensity have been investigated. The measurements showed different pulse characteristics for the two lasing processes affected by plasma inhomogeneity in temperature and density. Analytical expressions of these characteristics for both collisional-and photopumping are derived. It is found that the plasma that maximizes the photo-pumping lasing is 20% hotter and 70% denser than the plasma that optimizes the collisional-pumping lasing. The gain of collisional pumping is %4 times higher than the gain for the photo-pumping. The gain lifetime is a factor of %5.2 larger for the monopole-pumping. Similarly, the gain thickness is a factor of %1.8 larger. It is also found that the gain build-up time for collisional-and photo-pumping is 0.7 ps and 0.9 ps, respectively, whereas the build-up length-scale is 11.5 lm and 6.3 lm, respectively. Published by AIP Publishing. [http://dx.
Direct metrology of coherent short-wavelength beamlines is important for obtaining operational beam characteristics at the experimental site. However, since beam-time limitation imposes fast metrology procedures, a multi-parametric metrology from as low as a single shot is desirable. Here a two-dimensional (2D) procedure based on high-resolution Fresnel diffraction analysis is discussed and applied, which allowed an efficient and detailed beamline characterization at the SACLA XFEL. So far, the potential of Fresnel diffraction for beamline metrology has not been fully exploited because its high-frequency fringes could be only partly resolved with ordinary pixel-limited detectors. Using the high-spatial-frequency imaging capability of an irradiated LiF crystal, 2D information of the coherence degree, beam divergence and beam quality factor M were retrieved from simple diffraction patterns. The developed beam metrology was validated with a laboratory reference laser, and then successfully applied at a beamline facility, in agreement with the source specifications.
Wavefront analysis is a fast and reliable technique for the alignment and characterization of optics in the visible, but also in the extreme ultraviolet (EUV) and X-ray regions. However, the technique poses a number of challenges when used for optical systems with numerical apertures (NA) > 0.1. A high-numerical-aperture Hartmann wavefront sensor was employed at the free electron laser FLASH for the characterization of a Schwarzschild objective. These are widely used in EUV to achieve very small foci, particularly for photolithography. For this purpose, Schwarzschild objectives require highly precise alignment. The phase measurements acquired with the wavefront sensor were analyzed employing two different methods, namely, the classical calculation of centroid positions and Fourier demodulation. Results from both approaches agree in terms of wavefront maps with negligible degree of discrepancy.
We present a novel, to the best of our knowledge, Hartmann wave front sensor for extreme ultraviolet (EUV) spectral range with a numerical aperture (NA) of 0.15. The sensor has been calibrated using an EUV radiation source based on gas high harmonic generation. The calibration, together with simulation results, shows an accuracy beyond λ / 39 root mean square (rms) at λ = 32 n m . The sensor is suitable for wave front measurement in the 10 nm to 45 nm spectral regime. This compact wave front sensor is high-vacuum compatible and designed for in situ operations, allowing wide applications for up-to-date EUV sources or high-NA EUV optics.
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