Diamond-like carbon (DLC) films are deposited on rubber surfaces to protect the rubber components, and surface pretreatment of the rubber substrates prior to the film deposition can improve the adhesion between the DLC films and the rubber. Thus, the principal purpose of this work concentrates on determining the effects of argon (Ar), oxygen (O2), nitrogen (N2), and hydrogen (H2) plasma pretreatments on the adhesion and friction performance of the DLC films deposited on rubber (DLC/rubber). The results indicated that the Ar plasma pretreatment promoted the formation of a compact layer on the rubber surface. By contrast, massive fillers were exposed on the rubber surface after oxygen or nitrogen plasma pretreatments. Moreover, the typical micrometer-scale patches divided by random cracks were observed on the surface of DLC/rubber, except for the sample pretreated with oxygen plasma. The adhesion of DLC/rubber was found to strengthen with the removal of weak boundary layers and the generation of free radicals on the rubber surface after plasma pretreatment. The tribo-tests revealed that DLC/rubber with O2, N2, and H2 plasma pretreatments cannot achieve optimal friction performance. Significantly, DLC/rubber with Ar plasma pretreatment exhibited a low and stable friction coefficient of 0.19 and superior wear resistance, which was correlated to the high adhesion, good load-bearing of the rubber surface, and the approximate sine function of the surface profile of the DLC film.
An ion source based on a hollow-cathode Penning discharge was switched to a high-current pulsed mode (tens of amperes and tens of microseconds) to produce an intense hydrogen ion beam. With molecular hydrogen (H2), the ion beam contained three species: H(+), H2(+), and H3(+). For all experimental conditions, the fraction of H2 (+) ions in the beam was about 10 ÷ 15% of the total ion beam current and varied little with ion source parameters. At the same time, the ratio of H(+) and H3(+) depended strongly on the discharge current, particularly on its distribution in the gap between the hollow and planar cathodes. Increasing the discharge current increased the H(+) fraction in ion beam. The maximum fraction of H(+) reached 80% of the total ion beam current. Forced redistribution of the discharge current in the cathode gap for increasing the hollow cathode current could greatly increase the H3(+) fraction in the beam. At optimum parameters, the fraction of H3(+) ions reached 60% of the total ion beam current.
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