The pseudo-spark electron beam ablation (PSA) technique is a comparatively simple and inexpensive method of depositing thin films of oxide materials. The effects of both the breakdown voltage of the discharge and the oxygen pressure on the power density of a pulsed electron beam and on the efficiency of the ?SA process are studied. The PSA technique is applied to the deposition of YEa2Cu307-x thin films on single crystal SrTiOa and MgO substrates.Thin films with zero resistance transition temperature around 87 U have been prepared at breakdown voltages from 18 to 25 kV. The role of the oxygen pressure in the PSA process, which is typically one order of magnitude less than that for a typical laser ablation system, is discussed. In situ spectral analysis of the radiative emission from the plasma plume has also been performed at different breakdown voltages of the discharge in an attempt to understand the behaviour of the target constituents in response to intensive pulsed electron beams.
scite is a Brooklyn-based organization that helps researchers better discover and understand research articles through Smart Citations–citations that display the context of the citation and describe whether the article provides supporting or contrasting evidence. scite is used by students and researchers from around the world and is funded in part by the National Science Foundation and the National Institute on Drug Abuse of the National Institutes of Health.