This study demonstrates a method for the deposition of CuO x thin films by combining atmospheric pressure plasma jet with spark discharge. In this type of discharge source, the bulk copper material of spark discharge electrodes plays the role of a precursor. Copper atoms and particles go through the physical processes of sputtering, evaporation, and further agglomeration and condensation in the plasma jet and on the substrate. The experiments were carried out with and without a combination of discharges. The material coated on the substrate was studied using a scanning electron microscope, Raman spectroscopy, and energy-dispersive X-ray spectroscopy. The characteristics of the setup and plasma, such as I-V curves, optical emission spectra, and substrate temperature, were also measured. Copper electrodes were examined for erosion by a scanning electron microscope. The results demonstrate that deposits coated by combined discharge show denser and thicker films. K E Y W O R D S atmospheric pressure plasma jet, dielectric barrier discharge, low-temperature atmospheric-pressure plasma, spark discharge, thin film deposition
This paper presents the results of optical and probe diagnostics of hydrogen plasma flow in a coaxial plasma accelerator. The triple probe and the Optosky ATP2000P linear spectrometer with a spectral range of 200-1100 nm were used for measuring the electron current and obtaining the hydrogen plasma emission spectrum. The individual spectral lines were observed using an M833 monochromator spectrometer with a spectral resolution of 0.024 nm. From the measured electron currents and emission spectrums, the electron densities in the flux of a hydrogen pulsed plasma were calculated. We used the Stark method of Hβ hydrogen line broadening for calculations of electron densities. The obtained experimental results from the probe and spectroscopic measurements of electron density correspond well. In this work, we also obtained the dependence of the electron density on the voltages applied to the capacitor bank. The electron density increases with increasing voltage, because of the increased energy applied to the discharge. The average electron densities in the plasma flux showed 𝑛 𝑒 = 1.13 • 10 21 m -3 , 𝑛 𝑒 = 4.14 • 10 21 m -3 , and 𝑛 𝑒 = 5.57 • 10 21 m -3 at three values of voltages of 3 kV, 4 kV, and 5 kV, respectively.
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