The paper is devoted to the growth of thin SiC films by the method of substitution of atoms on macro-and mesoporous substrates of p-and n-type silicon of (100) orientation. On the mesoporous Si (100) substrates polycrystalline 3C-SiC films were formed, the crystallite size determined from XRD patterns was 27.5 nm. The obtained structures are studied by the methods of scanning electron and atomic-force microscopy, micro-Raman spectroscopy and X-ray diffraction analysis.

No abstract

No abstract

No abstract

No abstract