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NiTi thin films of nearly equi-atomic composition were obtained by magnetron sputtering of a composite target. The target was composed of sectors of Ni and Ti. Sputter yields of Ni and Ti were considered in selecting the mosaic pattern to sputter nearly equal number of particles of Ni and Ti from the target. The deposited films were analysed by energy dispersive x-ray analysis. It was observed that the composition of the films formed is dependent on the process parameters such as sputtering pressure, substrate-target distance, and sputtering power. The transport process of sputtered nickel and titanium species from the DC magnetron mosaic target was simulated using a Monte Carlo technique. The composition ratio of condensed Ni and Ti was calculated for different sputtering gas pressures and substrate-target distances. The theoretical results were compared with experimental data, and the influence of process parameters as well as the pattern of mosaic target on the composition of the films was studied.