Articles you may be interested inErratum: "Comparison of the submicron particle analysis capabilities of Auger electron spectroscopy, time-offlight secondary ion mass spectrometry, and scanning electron microscopy with energy dispersive x-ray spectroscopy for particles deposited on silicon wafers with one micron thick oxide layers" [J.Comparison of the submicron particle analysis capabilities of Auger electron spectroscopy, time-of-flight secondary ion mass spectrometry, and scanning electron microscopy with energy dispersive x-ray spectroscopy for particles deposited on silicon wafers with 1 μm thick oxide layers Development of a multifunctional surface analysis system based on a nanometer scale scanning electron beam: Combination of ultrahigh vacuumscanning electron microscopy, scanning reflection electron microscopy, Auger electron spectroscopy, and xray photoelectron spectroscopy Rev.Timeofflight secondary ion mass spectrometry of insulators with pulsed charge compensation by lowenergy electrons J.Particulate contamination can result in a significant yield loss during semiconductor device fabrication. As device design rule dimensions decrease the critical defect size also decreases, resulting in the need to analyze smaller defects. Current manufacturing requirements include analysis of sub-0.5-m defects, with analysis of sub-0.1-m defects expected in the near future. This article investigates the particle analysis capabilities of Auger electron spectroscopy, time-of-flight secondary ion mass spectrometry, and energy dispersive x-ray spectroscopy during scanning electron microscopy ͑SEM/EDS͒. In order to evaluate each method carefully, a standard set of samples was prepared and analyzed. These samples consist of 0.5-, 0.3-, and 0.1-m Al and Al 2 O 3 deposited on 1-in. Si wafers. Although all the methods observed an Al signal, a semiquantitative gauge of capability based on the relative strengths of particle versus substrate signal is provided. The dependence of the sample-to-substrate signal on primary electron energy is examined for both EDS and Auger analyses. The ability to distinguish metallic Al particles from Al oxide particles for the three techniques is also discussed.
A variety of optical and analytical instruments have been employed to observe and characterize the microstructure and composition of the B-containing phases which occur in sintered a-Sic as a result of either their use as a densification aid or that which evolves as a result of annealing well below the sintering temperatures. The former have been identified as B,C containing a small amount of Si. The latter occur as =20-nm precipitates which have also been tentatively identified as B,C and are believed to contain trace quantities of Si. No B phase was observed on the BC grain boundaries; furthermore, the precipitate formation was not enhanced by the application of stress.
Retainers were collected from private, university, and dental labs. After viewing these corroded and control appliances using scanning electron microscopy, corroded maxillary and mandibular retainers were selected along with a control stainless-steel retainer for in-depth chemical analysis. Using electron spectroscopy for chemical analysis, monochromated Al x-rays were rastered over areas 1.5 x 0.3 mm. After survey spectra were acquired, high-resolution multiplex scans were obtained and binding energy shifts were noted. Using Auger electron spectroscopy, a spot size of approximately 30 nm was analyzed. Photos, survey scans, and depth profiles were acquired using a 3.5kV Ar(+) ion beam that was calibrated using a SiO2 standard. Via electron spectroscopy for chemical analysis, the brown stains contained Fe and Cr decomposition products in which three carbon species were present. Proteinaceous N was found as amines or amides. No Ni was present because it had solubilized. The Cr:Fe ratio indicated severe Cr depletion in the stained regions (0.2) versus the control regions (1.3). The stained regions appeared mottled, having both dark and light areas. Via AES, the dark versus light areas of the stained regions indicated that there was an absence versus a presence of both Cr and Ni. In the dark areas corrosion penetrated 700 nm; in the light areas the depth equaled 30 nm. By comparison, the passivated layer of the control retainer was 10-nm thick. After sputtering away the affected areas, all specimens had similar spectra as the control regions. The bacterial environment created the mottled appearance and induced electrochemical potential differences so that, upon reducing the passivated layer, an otherwise corrosion-resistant alloy became susceptible to rampant corrosion. An integrated biological-biomaterial model is presented for the classic case of an orthodontic acrylic-based stainless steel retainer subject to crevice corrosion.
scite is a Brooklyn-based organization that helps researchers better discover and understand research articles through Smart Citations–citations that display the context of the citation and describe whether the article provides supporting or contrasting evidence. scite is used by students and researchers from around the world and is funded in part by the National Science Foundation and the National Institute on Drug Abuse of the National Institutes of Health.