The fabrication of silicon nanohole (SiNH) using a combination of electron beam lithography (EBL) and reactive ion etching (RIE) processes is reported. The optimum exposure dose of EBL process was found to be in the range of 210-240 µC/cm 2 due to small enlargement of hole diameter after pattern development process. The anisotropic etching and isotropic etching was achieved at low and high reaction pressures, respectively. As expected, the etching rate increase with time and RF power. A relatively smooth and well-defined NH has been obtained at RF power of 100 W and reaction pressure of 0.08 Torr, which is suitable to be applied for optical waveguide.
Abstrak -Penelitian ini bertujuan untuk membuat aplikasi program berbasis Matlab. Program Matlab ini digunakan untuk menganalisa sifat lasing kaca TZBN yang didadah ion Nd 3+ , dengan komposisi 60TeO 2 -(35- ( x = 0,5; 1; 1,5; 2 mol%). Metode yang digunakan dalam penelitian ini adalah pemodelan matematis dan analisis numerik. Program berbasis Matlab ini digunakan untuk menghitung parameter -parameter Judd Ofelt yang meliputi peluang transisi radiatif, peluang transisi radiatif total, radiatif lifetime dan branching ratio. Analisis perhitungan parameter -parameter Judd Ofelt menunjukkan kesalahan relatif rata-rata 1,156% terhadap perhitungan manual, sehingga program ini dapat digunakan untuk menganalisa sifat lasing kaca TZBN:Nd. Sifat lasing kaca TZBN:Nd yang ditunjukkan dari nilai probabilitas transisi dan branching ratio yang tertinggi pada level 4 F 3/2 4 I 11/2 dan tertinggi pada sampel K3 (x=0,5 mol%). Terdapat transisi dari level 4 F 3/2 4 I 15/2 yang bersesuaian dengan panjang gelombang 1380nm sehingga sampel kaca ini dapat digunakan sebagai material host laser pada jendela 1300 nm.
Kata kunci: Parameter -parameter Judd Ofelt, Microsoft Excel, Software Matlab , dan kaca TZBN: NdAbstract -This research aims to create an application based on Matlab program. This program was used to analyze the lasing properties of the glass TZBN doped Nd 3 + ions , the composition of this glass were 60TeO 2 -( 35 -x ) ZnO -2Bi 2 O 3 -3Na 2 O -xNd 2 O 3 with variations x = 0.5 , 1, 1.5 , 2 mol % . The method in this study was a combination between mathematical modeling and numerical analysis. This program was used to calculate the Judd Ofelt parameters, such as radiative transition probabilities , the total radiative transition probabilities, radiative lifetime, and branching ratio . From the calculation Judd Ofelt parameters showed the averaged relative error were 1,156% to manual calculation, so this program can be used to analyze the lasing properties of glass TZBN : Nd . The lasing properties of glass TZBN : Nd were showed from radiative transition probabilities and branching ratio that higher in 4 F 3/2 4 I 11/2 level and the higher composition was sample K3(x=0,5 mol%). There was transition in level 4 F 3/2 4 I 15/2 at 1380nm so this glass can be used to host laser material in 1300 nm window.
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