Natural Aloe vera paste has been reported as an alternative organic dielectric material. In this study, natural Aloe vera paste incorporated with silicon dioxide (SiO2) nanoparticles (NPs) has been investigated. The natural Aloe vera paste with different weight loading (0.5 to 3.8 wt%) of SiO2 NPs was screen printed on aluminum (Al) layer supported by a soda lime glass substrate and dried at room temperature. The solidified sample with 1.5 wt% of SiO2 NPs showed the lowest leakage current density. Next, the solidified samples were additional dried in an oven at 40°C for 30 minutes to study its effect against room temperature. The additional drying process facilitated cross-linking on natural Aloe vera layer and consequently enhanced the dielectric properties of the natural Aloe vera with 1.5 wt% of SiO2 NPs, whereby leakage current and dielectric constant were decreased and increased, respectively.
This study reports on fullerene-based organic field-effect transistor (C60-based OFET) with a combination of solution-processable natural Aloe vera blended with 1.5 wt% of SiO2 nanoparticles as a natural gate dielectric. The natural gate dielectric is screen-printed on a glass substrate followed by thermally evaporation of a layer of C60 semiconductor to form a bottom-gate and top-contact OFET structure. Surface energy concept has been used to justify selection of the gate dielectric and semiconductor layers. The OFET operates under open air and exhibits an effective mobility and threshold voltage of 1.110 cm2/V s and 0 V, respectively. After two weeks exposure in air, the parameters reduce but on/off current ratio and sub-threshold swing improve significantly.
scite is a Brooklyn-based organization that helps researchers better discover and understand research articles through Smart Citations–citations that display the context of the citation and describe whether the article provides supporting or contrasting evidence. scite is used by students and researchers from around the world and is funded in part by the National Science Foundation and the National Institute on Drug Abuse of the National Institutes of Health.