Solution-processed ultra-thin (∼3 nm) zinc tin oxide (ZTO) thin film transistors (TFTs) with a mobility of 8 cm2/Vs are obtained with post spin-coating annealing at only 350 °C. The effect of light illumination (at wavelengths of 405 nm or 532 nm) on the stability of TFT transfer characteristics under various gate bias stress conditions (zero, positive, and negative) is investigated. It is found that the ΔVth (Vthstress 3400 s − stress 0 s) window is significantly positive when ZTO TFTs are under positive bias stress (PBS, ΔVth = 9.98 V) and positive bias illumination stress (λ = 405 nm and ΔVth = 6.96 V), but ΔVth is slightly negative under only light illumination stress (λ = 405 nm and ΔVth = −2.02 V) or negative bias stress (ΔVth = −2.27 V). However, the ΔVth of ZTO TFT under negative bias illumination stress is substantial, and it will efficiently recover the ΔVth caused by PBS. The result is attributed to the photo-ionization and subsequent transition of electronic states of oxygen vacancies (i.e., Vo, Vo+, and Vo++) in ZTO. A detailed mechanism is discussed to better understand the bias stress stability of solution processed ZTO TFTs.

Ultra-thin zinc-tin oxide (ZTO) films (∼7 nm thick) with different Sn/(Sn+Zn) molar ratios, fabricated by using a solution process in combination of spin coating method, are applied as channel layers in thin film transistors (TFTs) with a bottom-gate top-contact structure. With regard to material characteristics, oxygen deficiency in ZTO films can be substantially decreased with the addition of different Sn contents. The non-Sn added ZnO TFT cannot be turned on whereas the Sn added ZTO channel layers perform TFT characteristics adequately, indicating the necessity of reducing oxygen deficiency by introducing Sn during the solution synthesizing process. With a Sn/(Sn+Zn) molar ratio of 0.5, the ZTO TFT exhibits the best field-effect mobility of ∼2.0 cm2/V s and a large on/off current ratio of ∼108. The electrical characteristics of ZTO TFTs are explored and correlated to the levels of oxygen deficiency associated with various Sn contents.

A nonvolatile charge trapping memory is demonstrated on a thin film transistor (TFT) using a solution processed ultra-thin (~7 nm) zinc tin oxide (ZTO) semiconductor layer with an Al2O3/Ni-nanocrystals (NCs)/SiO2 dielectric stack. A positive threshold voltage (V TH) shift of 7 V is achieved at gate programming voltage of 40 V for 1 s but the state will not be erased by applying negative gate voltage. However, the programmed V TH shift can be expediently erased by applying a gate voltage of  −10 V in conjunction with visible light illumination for 1 s. It is found that the sub-threshold swing (SS) deteriorates slightly under light illumination, indicating that photo-ionized oxygen vacancies (

Carrier transport properties of solution processed ultra thin (4 nm) zinc-tin oxide (ZTO) thin film transistor are investigated based on its transfer characteristics measured at the temperature ranging from 310 K to 77 K. As temperature decreases, the transfer curves show a parellel shift toward more postive voltages. The conduction mechanism of ultra-thin ZTO film and its connection to the density of band tail states have been substantiated by two approaches, including fitting logarithm drain current (log ID) to T−1/3 at 310 K to 77 K according to the two-dimensional Mott variable range hopping theory and the extraction of density of localized tail states through the energy distribution of trapped carrier density. The linear dependency of log ID vs. T−1/3 indicates that the dominant carrier transport mechanism in ZTO is the variable range hopping. The extracted value of density of tail states at the conduction band minimum is 4.75 × 1020 cm−3 eV−1 through the energy distribution of trapped carrier density. The high density of localized tail states in the ultra thin ZTO film is the key factor leading to the room-temperature hopping transport of carriers among localized tail states.