No abstract

Hole mobility is found to more than double in fabricated p-MOSFETs with SiGe source/drain due to longitudinal compressive stress in the channel exceeding 1 GPa. The maximum observed low-field mobility enhancement is 140% at a simulated stress level of 1.45 GPa. The mobility enhancement is approximately linear with stress at moderate levels but becomes super-linear above 1 GPa. An important consequence of this behavior is that for moderate stress levels, an average channel stress can be used to estimate the performance of transistors with a nonuniform stress distribution across the channel width. Two alternative approaches to model stress-enhanced hole mobility are suggested. Analysis of the physical effects behind the experimental observations reveals the relative roles of band repopulation and mass modulation. In addition, previously published wafer bending experiments with compressive stress levels below 400 MPa are used to implicitly verify the accuracy of the stress simulations.Index Terms-MOSFET, SiGe, strained-silicon, technology computer-aided design (TCAD).

No abstract

No abstract

No abstract