We have studied the photoreflectance spectra at 300 K from a number of GaAs/Ga1−x AlxAs heterojunction bipolar transistor (HBT) structures grown by molecular beam epitaxy and metalorganic chemical vapor deposition. From the observed Franz–Keldysh oscillations we have been able to evaluate the built-in dc electric fields Fdc in the Ga1−x Alx As emitter as well as the n−-GaAs collector region. In addition, the Ga1−x Alx As band gap (and hence Al composition) has been determined. The obtained values of Fdc are in good agreement with numerically computed values for the analyzed HBT structures, thus making it possible to deduce doping levels in these sections.
We show that defect inhomogeneities of sizes larger than the electron mean free path are responsible for the low values and anomalous temperature dependence of the electron mobility in semi-insulating (SI) GaAs. The room-temperature electron mobility values below about 6000 cm2/V s cannot be uniquely used for the determination of the concentration of ionized defects, since the contribution from inhomogeneities usually exceeds that from scattering by ionized impurities. The effects of the macroscopically inhomogeneous distribution of residual acceptors and the major deep donor EL2 diminish at elevated temperatures between 600 and 900 K, which offers a means for identification of inhomogeneities, and furthermore explains recently reported steplike mobility versus temperature behavior in SI-GaAs.
Deep levels due to titanium were identified for the first time in InP and GaAs employing capacitance transients and optical absorption measurements. They were found to be Ti4+/Ti3+ donor levels at energies of 0.63±0.03 eV and 1.00±0.03 eV in InP and GaAs, respectively. The near midgap location of this donor level in InP is technologically very significant, since it provides a new means for obtaining semi-insulating InP with a resistivity of about 107 Ω cm. The thermal stability of Ti-doped InP should be superior to that of Fe-doped InP. A formulation involving the Ti dopant and shallow acceptor impurities for obtaining semi-insulating InP from the melt is presented.
We present the first positive identification of a vanadium-related electron trap in V-doped GaAs crystals grown by the liquid encapsulated Czochralski technique in pyrolytic boron nitride crucibles. Detailed deep level transient spectroscopy and capacitance transient analysis yielded a trap energy of 0.15±0.01 eV below the conduction band and an electron capture cross section of about 2×10−14 cm2. Optical absorption and mobility data show that this level corresponds to the ionized acceptor state V2+(3d3) of substitutional vanadium. No midgap levels other than EL2 could be detected in these V-doped crystals showing that doping with vanadium plays no direct role in the compensation process in semi-insulating GaAs crystals.
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