)>IJH=?J Corrosion is a traditional problem but still one of the most serious problems in industry. To reduce the huge economic loss caused by corrosion, tremendous eort has been made to understand, predict and prevent it. Corrosion phenomena are generally explained by the formation of corrosion cells at a metalelectrolyte interface. However, experimental verication of their nanoscale distribution has been a major challenge *
A new in-situ measurement technique for analyzing corrosion of the submicron level area in liquids was developed. In this technique, after topography is measured with a scanning tunneling microscope (STM), the measurement mode is switched and electrochemical measurements such as cyclic voltammetry are conducted by using the STM probe as a working electrode. The distance between the probe and the material is separated up to the distance where the tunneling current does not flow. The valency, concentration, and species of dissolution ions from metal can be inferred according to potential and the current density of the reduction peak of a cyclic voltammogram. We report the corrosion behavior of copper minuteness wiring using the new technique.
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馬渕 勝美Correlation between the physical and chemical properties of the reaction products and dissolution behavior of copper in Cu-CMP slurry containing hydrogen peroxide was studied. The solubility behavior of the copper was evaluated for corrosion current density using Tafel plots with a rotating electrode that had an original load addition function. The physical and chemical properties of the product were evaluated using AES, XPS, and a nanoindenter. Numerous reaction products with low hardness were generated under the condition with a large corrosion current density under the load. With high corrosion current density, the reaction products consisted of Cu and the additives as the main constituents. In contrast, when the corrosion current density was low, copper oxide predominated. These results indicate that controlling the oxide generation rate and the reactive generation rate of the additive is important for increasing the rate and enabling both to coexist smoothly. Regarding enabling the coexistence of speed-up and flattening, the proportional control of the oxide generation rate and the generation rate of the reactant with the additive is important.
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