Abstract. The article is devoted to obtaining and studying of films of molybdenum disulfide for applications in electronics. The paper presents the results of processing images obtained using optical and atomic force microscopy of films deposited by magnetron sputtering. The structure of the substrate has shown significant influence on structure of film of MoS 2 .
In this article, we present the results of AFM studies on molybdenum disulfide ultrathin films (with a thickness of 3 to 13 nm) deposited on silicon substrates in vacuum by the magnetron sputtering MoS2 target during 10, 20 and 30 seconds. The film samples structural features were estimated and the deposition time influence on surface roughness, crystals size and its distribution asymmetry, fractal dimension was determined.
The results of spectrophotometric and AFM researches of molybdenum disulfide ultrathin films, obtained on silicon substrates by magnetron deposition at various technological conditions are presented.
The article presents the optical spectroscopy results of molybdenum disulfide ultrathin films deposited on Si substrates by the methods of direct current (DCMS) and pulsed (PMS) magnetron sputtering MoS2 target in vacuum, and also at flow deposition under the influence of external magnetic field on the substrate. Furthermore, the article revues the results of optical bandgap calculation for all samples of MoS2 thin films.
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