Fluorinated amorphous carbon (a-C:F) films were deposited by radio frequency bias assisted microwave plasma electron cyclotron resonance chemical vapor deposition with tetrafluoromethane (CF4) and acetylene (C2H2) as precursors. The deposition process was performed at two flow ratios R=0.90 and R=0.97, where R=CF4/(CF4+C2H2). The samples were annealed at 300 °C for 30 min. in a N2 atmosphere. Both Fourier transform infrared and electron spectroscopy for chemical analyzer were used to characterize the a-C:F film chemical bond and fluorine concentration, respectively. A high resolution electron energy loss spectrometer was applied to detect the electronic structure. The higher CF4 flow ratio (R=0.97) produced more sp3 linear structure, and it made the a-C:F film smoother and softer. A lifetime of around 0.34 μs and an energy gap of ∼2.75 eV were observed in both the as-deposited and after annealing conditions. The short carriers lifetime in the a-C:F film made the photoluminescence peak blueshift. The annealing changed both the structure and composition of the a-C:F film. The type of fluorocarbon bond and electronic structure characterized the mechanical and physical properties of a-C:F film.
Unlike general fluorination, amorphous fluorinated carbon (a-C:F) nanostructures have been synthesized directly and efficiently by an electron cyclotron resonance chemical vapor deposition (ECR–CVD) system using a mixture of C2H2, CF4, and Ar as precursors. The electron field-emission properties of the a-C:F nanostructures were investigated. The a-C:F nanoporous films with a low turnon field (1.8V∕μm) are apparently lower than other types of a-C:F nanostructures. The a-C:F nanostructures have a greater field-enhancement factor (2500–4000) than other nonaligned multiwall nanotubes. However, the a-C:F nanostructures follow the Fowler–Nordheim characteristics only in the medium emission current region and they deviate from the characteristics in the low and high emission current regions.
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