2004
DOI: 10.1063/1.1828595
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Electron field emission from various morphologies of fluorinated amorphous carbon nanostructures

Abstract: Unlike general fluorination, amorphous fluorinated carbon (a-C:F) nanostructures have been synthesized directly and efficiently by an electron cyclotron resonance chemical vapor deposition (ECR–CVD) system using a mixture of C2H2, CF4, and Ar as precursors. The electron field-emission properties of the a-C:F nanostructures were investigated. The a-C:F nanoporous films with a low turnon field (1.8V∕μm) are apparently lower than other types of a-C:F nanostructures. The a-C:F nanostructures have a greater field-e… Show more

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Cited by 37 publications
(10 citation statements)
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“…In the presented work, we investigated field-emission properties of nanoporous carbon (NPC) [27][28][29][30][31][32][33][34]-one of all-carbon materials with disordered nanoscale structure. Due to developed pore/skeleton interface, homogeneity of pore size, strong adsorption ability, relatively high electric conductivity, and mechanical strength, the NPC materials give considerable promise for diverse applications, including manufacture of field electron emitters [35] for microwave, light, and X-ray sources, plasma devices, space thrusters, and microelectronic components and gauges.…”
Section: Introductionmentioning
confidence: 99%
“…In the presented work, we investigated field-emission properties of nanoporous carbon (NPC) [27][28][29][30][31][32][33][34]-one of all-carbon materials with disordered nanoscale structure. Due to developed pore/skeleton interface, homogeneity of pore size, strong adsorption ability, relatively high electric conductivity, and mechanical strength, the NPC materials give considerable promise for diverse applications, including manufacture of field electron emitters [35] for microwave, light, and X-ray sources, plasma devices, space thrusters, and microelectronic components and gauges.…”
Section: Introductionmentioning
confidence: 99%
“…It is known that Teflon is produced during CF 4 plasma treatments, 13,14 as such a layer apparently lowers the work function of the coated material. 14,15 We note that the island is placed at distances of 12 and 26 nm toward source and drain, respectively (see Figure 1b). The gating electrode is placed at a slightly larger distance away of 35 nm.…”
mentioning
confidence: 96%
“…In addition, according to the FN plot, the slope m [given in eq. ( 1)] would represent the combined effect of work function and enhancement of local electric field () and is given by m ¼ ÀðB 3=2 Þ=, using ¼ 4:7 eV for the work function of DLC, 21,22) the field enhancement factor was calculated from the slope of the F-N plot. The enhancement factors are 3:5 Â 10 4 and 1:9 Â 10 4 , respectively for the films prepared at TMS flow 20 and 15 sccm, respectively.…”
Section: Resultsmentioning
confidence: 99%