Abstract. The dependences of the 294 and 10 K mobility μ and volume carrier concentration n on thickness (d ¼ 25 to 147 nm) are examined in aluminum-doped zinc oxide (AZO). Two AZO layers are grown at each thickness, one with and one without a 20-nm-thick ZnON buffer layer. Plots of the 10 K sheet concentration n s versus d for buffered (B) and unbuffered (UB) samples give straight lines of similar slope, n ¼ 8.36 × 10 20 and 8.32 × 10 20 cm −3 , but different x -axis intercepts, δd ¼ −4 and þ13 nm, respectively. Plots of n s versus d at 294 K produce substantially the same results. Plots of μ versus d can be well fitted with the equation μðd Þ ¼ μð∞Þ∕½1 þ d à ∕ðd − δdÞ, where d à is the thickness for which μð∞Þ is reduced by a factor 2. For the B and UB samples, dà ¼ 7 and 23 nm, respectively, showing the efficacy of the ZnON buffer. Finally, from n and μð∞Þ we can use degenerate electron scattering theory to calculate bulk donor and acceptor concentrations of 1.23 × 10 21 cm −3 and 1.95 × 10 20 cm −3 , respectively, and Drude theory to predict a plasmonic resonance at 1.34 μm. The latter is confirmed by reflectance measurements.

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We have studied the effects of the N2 gas flow rate on the surface morphology of ZnO films deposited by the sputtering of a ZnO target using Ar/N2. Height-height correlation function (HHCF) analysis indicates that introducing a small amount of N2 (<5 sccm) to the sputtering atmosphere enhances adatom migration, leading to a larger grain size in the ZnO films associated with an increase in the lateral correlation length. The HHCF analysis also reveals that films deposited with and without N2 exhibit a self-affine fractal surface structure. We demonstrate that utilizing such ZnO films deposited using Ar/N2 as buffer layers, the crystallinity of ZnO:Al (AZO) films on the buffer layers can be greatly improved. The electrical resistivity of 100-nm-thick AZO films decreases from 1.8×10-3 to 4.0×10-4 Ω·cm by utilizing a ZnO buffer layers prepared at N2 flow rate of 5 sccm.

Hydrogenated ZnO thin films have been successfully deposited on glass substrates via a nitrogen mediated crystallization (NMC) method utilizing RF sputtering. Here we aim to study the crystallinity and electrical properties of hydrogenated NMC-ZnO films in correlation with substrate temperature and H2 flow rate. XRD measurements reveal that all the deposited films exhibit strongly preferred (001) orientation. The integral breadth of the (002) peak from the hydrogenated NMC-ZnO films is smaller than that of the conventional hydrogenated ZnO films fabricated without nitrogen. Furthermore, the crystallinity and surface morphology of the hydrogenated NMC-ZnO films are improved by increasing substrate temperature to 400 °C, where the smallest integral breadth of (002) 2θ–ω scans of 0.83° has been obtained. By utilizing the hydrogenated NMC-ZnO films as buffer layers, the crystallinity of ZnO:Al (AZO) films is also improved. The resistivity of AZO films on NMC-ZnO buffer layers decreases with increasing H2 flow rate during the sputter deposition of buffer layers from 0 to 5 sccm. At a H2 flow rate of 5 sccm, 20-nm-thick AZO films with low resistivity of 1.5×10-3 Ω cm have been obtained.

In order to understand the optoelectronic properties of amorphous niobium oxide (a-NbO x ), we have investigated the valence states, local structures, electrical resistivity, and optical absorption of a-NbO x thin films with various oxygen contents. It was found that the valence states of Nb ion in a-NbO x films can be controlled from 5+  to 4+  by reducing oxygen pressure during film deposition at room temperature, together with changing the oxide-ion arrangement around Nb ion from Nb2O5-like to NbO2-like local structure. As a result, a four orders of magnitude reduction in the electrical resistivity of a-NbO x films was observed with decreasing oxygen content, due to the carrier generation caused by the appearance and increase of an oxygen-vacancy-related subgap state working as an electron donor. The tunable optoelectronic properties of a-NbO x films by valence-state-control with oxygen-vacancy formation will be useful for potential flexible optoelectronic device applications.