The Extreme-Ultraviolet Imaging Spectrometer (EIS) is the first of a new generation of normal-incidence, two-optical-element spectroscopic instruments developed for space solar extreme-ultraviolet astronomy. The instrument is currently mounted on the Solar-B satellite for a planned launch in late 2006. The instrument observes in two spectral bands, 170-210 A and 250-290 A. The spectrograph geometry and grating prescription were optimized to obtain excellent imaging while still maintaining readily achievable physical and fabrication tolerances. A refined technique using low ruling density surrogate gratings and optical metrology was developed to align the instrument with visible light. Slit rasters of the solar surface are obtained by mechanically tilting the mirror. A slit exchange mechanism allows selection among four slits at the telescope focal plane. Each slit is precisely located at the focal plane. The spectrograph imaging performance was optically characterized in the laboratory. The resolution was measured using the Mg iii and Ne iii lines in the range of 171-200 A. The He ii line at 256 A and Ne iii lines were used in the range of 251-284 A. The measurements demonstrate an equivalent resolution of ~2 arc sec? on the solar surface, in good agreement with the predicted performance. We describe the EIS optics, mechanisms, and measured performance.
We have measured the extreme-ultraviolet (EUV) efficiency of a polymer-overcoated blazed ion-etched holographic test grating. The grating had a magnetron-sputtered Mo2C/Si multilayer coating matched to the grating blaze angle of 2.78 degrees. At an angle of incidence of 5.6 degrees and a wavelength of 15.79 nm, the measured efficiency peaks in the second outside order at 29.9%. The derived groove efficiency is 53.0%. To the best of our knowledge these are the highest values obtained yet at EUV wavelengths from a holographic ion-etched blazed grating.
We characterized a laminar grating with a Mo/Si multilayer coating by using synchrotron radiation and atomic force microscopy. The grating substrate had 2400 grooves/mm, 40-A groove depth, and 2080-A groove width. The microroughness of the grating substrate was 5 A rms. The multilayer coating was optimized to have peak normal-incidence reflectance at a wavelength near 150 A. For an angle of incidence of 10 degrees the peak grating efficiency was 16.3% in the +1 order and 15.0% in the -1 order. The efficiency in the zero order was lower by a factor of 40 owing to the excellent matching of the groove depth and groove width to the wavelength of the incident radiation. By dividing the grating efficiencies by the measured reflectance of the multilayer coating, we obtained inferred groove efficiencies of 34% and 32% in the +1 and -1 orders, respectively.
The efficiency of an ion-etched laminar holographic grating was measured at near-normal incidence in the 14.5-16.0-nm wavelength range. The grating had an electron-beam-evaporated Mo/Si multilayer coating matched to the grating groove depth. The efficiency peaked at 16.3% in the first inside order at 15.12 nm and 15.0% in the first outside order at 14.94 nm. These are believed to be the highest efficiencies obtained to date from a multilayer-coated laminar grating at near-normal incidence in the EUV (lambda<30.0nm) . Zero and even orders were almost completely suppressed. The grating groove efficiency in the first order approached the theoretical limit of 40.5%.
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