We prepared othorhombic β-FeSi2 thin-films on Si(111) substrates by a pulsed laser deposition method (PLD) and studied the relationship between bandgap energy and composition ratio by themal annealing of β-FeSi2 thin-films on Si substrate. When the substrate temperature was 500·°C, β-FeSi2 thin-films were grown on Si(111) substrates. The sample prepared on Si(111) substrate was a monocrystalline structure since only (220) or (202) signals of β-FeSi2 were observed. A large amount of defects existed in the thin film. These defects were reduced by using high temperature and long time annealing. Heat treatment of 20 hours or more time was effective for reducing diffect. The iron diffusion of β-FeSi2/Si interface was observed by RBS spectra. Composition ratio of the prepared β-FeSi2 was Fe:Si=30:70. As-deposition β-FeSi2 was Si-rich. The p-n diode characteristics of these heterostructure diodes were investigated by C-V measurements. β-FeSi2/Si interface prepared by 400· °C was an ideal one-side step junction. The surface roughness was decreased by annealing.
β-phase iron disilicide (β-FeSi 2 ) was obtained on n-type silicon (111) substrate by using excimer laser annealing (ELA). β-phase crystal which have good electrical properties was grown within a narrow annealing condition such as energy density. All samples were annealed by excimer laser show n-type characteristic. Graded junction was formed in FeSi 2 /Si hetero diode.
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