Liquid-phase crystallized silicon absorber layers have been applied in heterojunction solar cells on glass substrates with 10.8% conversion efficiency and an open-circuit voltage of 600 mV. Intermediate layers of SiO x , SiN x , and SiO x N y , as well as the a-Si:H precursor layer, were deposited on 30 cm × 30 cm glass substrates using industrial-type plasma-enhanced chemical vapor deposition equipment. After crystallization on 3 cm × 5 cm area using a continuous-wave infrared laser line, the resulting polysilicon material showed high material quality with large grain sizes. Index Terms-Heterojunction, liquid-phase crystallization, plasma-enhanced chemical vapor deposition (PECVD), thin-film silicon.
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