Extreme Ultraviolet (EUV) optical components used in EUV lithography tools are continuously impacted by an exotic and highly transient type of plasma: EUV-induced plasma. Such an EUV-induced plasma is generated in a repetitive fashion upon sending a pulsed beam of high energy (92 eV) photons through a low-pressure background gas. Although its formation occurs on a time scale of ∼100 ns, it is the plasma's decay dynamics on longer time scales that dictates the fluxes and energy distribution of the produced ions. Therefore, the plasma decay also determines the overall impact on plasma-facing EUV optical components. Enabled by electron density measurements using Microwave Cavity Resonance Spectroscopy at a much higher sensitivity, we clearly show the breakdown of the ambipolar field in an EUV photon-induced plasma below electron densities of ∼2 × 1012 m−3 and the—until now—unidentified transition from ambipolar diffusion-driven decay into a decay regime driven by free diffusion. These results not only further improve the understanding of elementary processes in this type of plasma but also have a significant value for modeling and predicting the stability and lifetime of optical components in EUV lithography.
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We present the design and commissioning of a resonant microwave cavity as a novel diagnostic for the study of ultracold plasmas. This diagnostic is based on the measurements of the shift in the resonance frequency of the cavity, induced by an ultracold plasma that is created from a laser-cooled gas inside. This method is simultaneously non-destructive, very fast (nanosecond temporal resolution), highly sensitive, and applicable to all ultracold plasmas. To create an ultracold plasma, we implement a compact magneto-optical trap based on a diffraction grating chip inside a 5 GHz resonant microwave cavity. We are able to laser cool and trap (7.25 ± 0.03) × 107 rubidium atoms inside the cavity, which are turned into an ultracold plasma by two-step pulsed (nanosecond or femtosecond) photo-ionization. We present a detailed characterization of the cavity, and we demonstrate how it can be used as a fast and sensitive probe to monitor the evolution of ultracold plasmas non-destructively. The temporal resolution of the diagnostic is determined by measuring the delayed frequency shift following femtosecond photo-ionization. We find a response time of 18 ± 2 ns, which agrees well with the value determined from the cavity quality factor and resonance frequency.
For the microwave cavity resonance spectroscopy based non-destructive beam monitor for ionizing radiation, an addition—which adapts the approach to conditions where only little ionization takes place due to, e.g., small ionization cross sections, low gas pressures, and low photon fluxes—is presented and demonstrated. In this experiment, a magnetic field with a strength of 57 ± 1 mT was used to extend the lifetime of the afterglow of an extreme ultraviolet-induced plasma by a factor of ∼5. Magnetic trapping is expected to be most successful in preventing the decay of ephemeral free electrons created by low-energy photons. Good agreement has been found between the experimental results and the decay rates calculated based on the ambipolar and classical collision diffusion models.
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