Plasma-assisted electron-beam evaporation leads to changes in the crystallinity, density, and stresses of thin films. A dual-source plasma system provides stress control of large-aperture, high-fluence coatings used in vacuum for substrates 1m in aperture.
Birefringent silica films are formed by glancing-angle deposition to fabricate quarter- and half-wave plates at a wavelength of 351 nm. A multilayer design is implemented to achieve low-loss transmittance with a high 351-nm laser-induced damage threshold.
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