Glancing-angle–deposited magnesium oxide films for high-fluence applications

Oliver, J. B.; Smith, C.; Spaulding, John; Rigatti, A. L.; Charles, B.; Papernov, Semyon; Taylor, Brittany; Foster, Justin C.; Carr, C. W.; Luthi, Ronald L.; Hollingsworth, B.; Cross, David A.

doi:10.1364/ome.6.002291

Cited by 20 publications

(9 citation statements)

References 29 publications

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“…It can be seen that after the deposition of 372.9 nm TiO 2 and 936.7 nm SiO 2 films, the power values of the reflected wave-fronts of these substrates were changed with 0.151 and −0.911λ (λ = 632.8 nm). Accordingly, the calculated stresses of the TiO 2 and SiO 2 films from Equations (8) and (9) were +164.8 and −395.8 MPa. Here, positive and negative stress values represent tensile and compressive stress, respectively.…”

Section: Single-layer Coatingsmentioning

confidence: 98%

“…With the development of vacuum-coating technology, the complexity of thin films has significantly increased, and mechanical stress control has become a major challenge. Excessive stress can cause delamination, deformation, or cracks, severely affecting the properties and the stability of thin-film devices [7][8][9][10]. Therefore, the optimization of mechanical stress is very much necessary for the better performance of optical coatings.…”

Section: Introductionmentioning

confidence: 99%

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Fabrication of Ultralow Stress TiO2/SiO2 Optical Coatings by Plasma Ion-Assisted Deposition

Guo

Kong

2020

Coatings

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Optical and mechanical properties of multilayer coatings depend on the selected layer materials and the deposition technology; therefore, knowledge of the performances of thin films is essential. In the present work, titanium dioxide (TiO2) and silicon dioxide (SiO2) thin films have been prepared by plasma ion-assisted deposition (PIAD). The optical, structural, and mechanical properties of thin films have been investigated using spectrometer/ellipsometer, X-ray diffraction (XRD), atomic force microscopy (AFM), and laser interferometer. The results show that TiO2 film fabricated by PIAD induces a high refractive index, wide optical band gap, amorphous structure, smooth surface, and tensile stress. In the case of SiO2 film, high bias voltage leads to dense structure and compressive stress. As an application, a three-wavelength high reflectance at 632.8, 808, and 1550 nm was optimized and deposited. The dependence of total stress in the multilayer on the substrate temperature was studied as well. In conclusion, it was demonstrated that PIAD is an effective method for the preparation of ultralow stress TiO2/SiO2 multilayer films. The achieved stress was as low as 1.4 MPa. The result could provide guidance to the stress optimization of most optical components without prefiguring, backside coating, and postdeposition treatments.

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Section: Single-layer Coatingsmentioning

confidence: 98%

Section: Introductionmentioning

confidence: 99%

Fabrication of Ultralow Stress TiO2/SiO2 Optical Coatings by Plasma Ion-Assisted Deposition

Guo

Kong

2020

Coatings

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“…GLAD films are used in linear polarizers [3], liquid crystal displays as alignment layers [4], optical coatings with low reflectance [5], and anti-reflection coatings for high power lasers [6]. GLAD, with alternation of deposition angle, ensures the fabrication of thin films for polarization rotators [7], birefrigent reflectors [8], and other optical devices requiring films with anisotropic properties and low refractive indexes.…”

Section: Introductionmentioning

confidence: 99%

Structure of Highly Porous Silicon Dioxide Thin Film: Results of Atomistic Simulation

2019

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The high-energy glancing angle deposition of silicon dioxide films with alternation of deposition angle is studied using classical atomistic simulation. Both slow and fast alternations are investigated. The growth of vertical tree-like columns and chevron-like regular structures is demonstrated under fast and slow alternations, respectively. Due to high porosity, the density of the deposited silicon dioxide films is reduced to 1.3 ÷ 1.4 g/cm3. This results in reduction of the refractive index to 1.3, which agrees with known experimental data. For slow continuous substrate rotation, formation of a helical structure is demonstrated.

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“…In the spectral range from visible to near IR, dielectric oxides are the choice of materials for the fabrication of low-loss optical coatings. Among the available oxide materials, including SiO 2 , Al 2 O 3 , MgO, Sc 2 O 3 , Y 2 O 3 , ZrO 2 , HfO 2 , ZnO, and Ta 2 O 5 , SiO 2 and Ta 2 O 5 have been commonly used as the low-and high-index materials [3][4][5][6][7][8][9][10][11] . In the past, plenty of investigations on optical and micro-structural properties of coatings combined with these two oxide materials have been implemented by various deposition techniques, such as ion beam sputtering [3] , plasma ion-assisted deposition (PIAD) [8] , magnetron sputtering [9] , etc.…”

mentioning

confidence: 99%

Fabrication of multi-wavelength visible and infrared filter for solar atmosphere tomographic imaging

Kong

Guo

et al. 2017

Chin. Opt. Lett.

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To simultaneously obtain high-resolution multi-wavelength (from visible to near infrared) tomographic images of the solar atmosphere, a high-performance multi-wavelength optical filter has to be used in solar imaging telescopes. In this Letter, the fabrication of the multi-wavelength filter for solar tomographic imaging is described in detail. For this filter, Ta 2 O 5 and SiO 2 are used as high-and low-index materials, respectively, and the multilayer structure is optimized by commercial Optilayer software at a 7.5°angle of incidence. Experimentally, this multi-wavelength optical filter is prepared by a plasma ion-assisted deposition technique with optimized deposition parameters.

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Glancing-angle–deposited magnesium oxide films for high-fluence applications

Cited by 20 publications

References 29 publications

Fabrication of Ultralow Stress TiO2/SiO2 Optical Coatings by Plasma Ion-Assisted Deposition

Fabrication of Ultralow Stress TiO2/SiO2 Optical Coatings by Plasma Ion-Assisted Deposition

Structure of Highly Porous Silicon Dioxide Thin Film: Results of Atomistic Simulation

Fabrication of multi-wavelength visible and infrared filter for solar atmosphere tomographic imaging

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