Sub-wavelength antireflection moth-eye structures were fabricated with Nickel mold using Roll-to-Plate (R2P) ultraviolet nanoimprint lithography (UV-NIL) on transparent polycarbonate (PC) substrates. Samples with well replicated patterns established an average reflection of 1.21% in the visible light range, 380 to 760 nm, at normal incidence. An excellent antireflection property of a wide range of incidence angles was shown with the average reflection below 4% at 50°. Compared with the unpatterned ultraviolet-curable resin coating, the resulting sub-wavelength moth-eye structure also exhibited increased hydrophobicity in addition to antireflection. This R2P method is especially suitable for large-area product preparation and the biomimetic moth-eye structure with multiple performances can be applied to optical devices such as display screens, solar cells, or light emitting diodes.
Ultrafast high‐temperature sintering (UHS) is a novel sintering technique with ultrashort firing cycles (e.g., a few tens of seconds). The feasibility of UHS has been validated on several ceramics and metals; however, its potential in consolidating glass–ceramics has not yet been demonstrated. In this work, an optimized carbon‐free UHS was utilized to prepare ZrO2–SiO2 nanocrystalline glass–ceramics (NCGCs). The phase composition, grain size, densification behavior, and microstructures of NCGCs prepared by UHS were investigated and compared with those of samples sintered by pressureless sintering. Results showed that NCGCs with a high relative density (~95%) can be obtained within ~50 s discharge time by UHS. The UHS processing not only hindered the formation of ZrSiO4 and cristobalite but also enhanced the stabilization of t‐ZrO2. Meanwhile, owing to the ultrashort firing cycles, the UHS technology allowed the NCGCs to be consolidated in a far from equilibrium state. The NCGCs showed a microstructure of spherical monocrystalline ZrO2 nanocrystallites embedded in an amorphous SiO2 matrix.
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