The mobility enhancement and the positive bias stress of top-gate self-aligned TFTs using the a-IGZO channel with a front barrier are investigated. The a-IGZO front barrier can keep electrons in the a-IGZO channel away from the top-gate oxide to significantly enhance the electron mobility at the top gate operation. The parasitic channel induces a hump in the transfer characteristics. The positive bias stress shifts the hump to the negative voltage abnormally. The H 2 O in the polymer film on array layer is responsible for the abnormal shift. The H 2 O diffuses into the top-gate insulator and is electrolyzed to create H + , which forms a parasitic channel with a negative shift of threshold voltage, leading to the abnormal hump. The abnormal humps are increasingly significant with the increasing channel width and the decreasing channel length. The channel width dependence on positive bias stress is due to the inverse narrow width effect caused by the fringe electric field. The channel length dependence on positive bias stress is due to the H + diffusion toward the center of the parasitic channel from both the source and drain sides.INDEX TERMS Positive bias stress (PBS), a-IGZO, hump, polymer film on array (PFA).
Switching dynamics of perpendicular magnetic tunnel junction (MTJ) driven by spin-orbit torque (SOT) are investigated by the Landau-Lifshitz-Gilbert (LLG)-based physical model considering the temperature dependence. The field-assisted switching method is proposed to develop the reliable sub-ns writing of SOT-magnetoresistive random-access memory (SOT-MRAM) by removing the plateau time. The conventional method of SOT-MTJ requires the large write current, leading to the area increase of access transistors and the penalty of memory density. The write current and the switching time of SOT-MTJ can be efficiently reduced at the same time by our field-assisted method using the enhanced magnetic field. The magnetic field can be provided by the Co magnetic hard mask above the MTJ. Considering an SOT-MRAM array, the surrounded Co metals have the insignificant influence of stray magnetic field on an MTJ at the center. With the write time of 0.2 ns, the 60% reduction of write current is achieved by our field-assisted method compared to the conventional method. The required write current for the SOT switching decreases with the increasing temperature due to the lowering of thermal stability factor. The write Shmoo plots are further analyzed to calculate the write current margin at the various working temperature. The write time of 0.2 ns exhibits the narrow margin of write current (2.6 µA) in the temperature range from 25 • C to 85 • C, while the write time of 0.8 ns has the wide write margin of 102 µA. The switching behavior and the write margin are also sensitive to the magnetic field. INDEX TERMS Failure analysis, magnetic memory, magnetic tunnel junction (MTJ), spin-orbit torque (SOT), spintronics.
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