X-ray photoelectron spectroscopy (XPS) is a very efficient and still progressing surface analysis technique. However, when applied to nano-objects, this technique faces drawbacks due to interactions with the substrate and sample charging effects. We present a new experimental approach to XPS based on coupling soft X-ray synchrotron radiation with an in-vacuum beam of free nanoparticles, focused by an aerodynamic lens system. The structure of the Si/SiO2 interface was probed without any substrate interaction or charging effects for silicon nanocrystals previously oxidized in ambient air. Complete characterization of the surface was obtained. The Si 2p core level spectrum reveals a nonabrupt interface.

A new technique has been used for the measurement of electron attachment rate coefficients for the molecules, SF6, CF3Br, and CCl2F2 at temperatures between 48 and 170 K. The results demonstrate very clearly the strong effect that internal vibrational energy of the molecules has on the attachment process.

The first direct measurement of the reaction rate constant of a polycyclic aromatic hydrocarbon in the gas phase in the temperature range 58-470 K is reported. The reaction is OH+ anthracene and the experiment has been performed in a continuous flow Cinetique de Reaction en Ecoulement Supersonique Uniforme apparatus, which had to be modified for this purpose. Pulsed laser photolysis of H(2)O(2) has been used to generate OH radicals and laser-induced fluorescence to observe the kinetic decay of the radicals and hence determine the rate coefficients. The reaction is found to be fast, and the rate constant increases monotonically as the temperature is lowered. The rate coefficients match the expression k(cm(3) molecules(-1) s(-1))=1.12 x 10(-10)(T/300)(-0.46).

Rate constants measured for the Cl−+CH3Br→CH3Cl+Br− reaction increase by over two orders of magnitude when the temperature is reduced from 300 to 23 K. Calculations done with the rotating bond approximation provide a simple explanation of this unusually strong negative temperature dependence of the rate constant.

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The dissociative recombination of electrons with the hexamethyldisiloxane (HMDSO) cation ((CH(3))(3)Si-O-Si(CH(3))(3))(+) and the pentamethyldisiloxane cation ((CH(3))(3)Si-O-Si(CH(2))(2))(+) as well as the ion-molecule reaction between Ar(+) and HMDSO have been studied at 300 K using a flowing afterglow Langmuir probe-mass spectrometer apparatus. The rate constants for these reactions, measured directly for the first time, are, respectively, alpha(1)=1.8 x 10(-6), alpha(2)=3.6 x 10(-6) cm(3)s, and k=2.0 x 10(-9) cm(3)s with uncertainties of +/-30%. In addition, the electronic attachment to neutral HMDSO was also studied and an upper limit value of the rate constant was determined to be beta=3.3 x 10(-11) cm(3)s.

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