Predicting the low-dose-rate degradation of bipolar technologies is one of the main issues for circuits intended for use in the ionizing-radiation environment of space because of the enhanced low-dose-rate sensitivity (ELDRS). In this letter, ELDRS is shown to be related to competition between trapping and recombination of radiation-induced carriers in the oxide. The presented model is shown to be in good agreement with experimental data. It is also shown that this effect is strongly dependent on the oxide quality.

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Thin silicon oxide layers on silicon substrates are investigated by scanning probe microscopy before and after irradiation with 210 MeV Au+ ions. After irradiation and complete chemical etching of the silicon oxide layer, silicon bumps grown on the silicon surface are observed. It is shown that each impinging ion induces one silicon bump at the interface. This observation is consistent with the thermal spike theory. Ion energy loss is transferred to the oxide and induces local melting. Silicon-bump formation is favored when the oxide and oxide-silicon interface are silicon rich.

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