No abstract

Group-III-nitride semiconductors have shown enormous potential as light sources for full-colour displays, optical storage and solid-state lighting. Remarkably, InGaN blue- and green-light-emitting diodes (LEDs) emit brilliant light although the threading dislocation density generated due to lattice mismatch is six orders of magnitude higher than that in conventional LEDs. Here we explain why In-containing (Al,In,Ga)N bulk films exhibit a defect-insensitive emission probability. From the extremely short positron diffusion lengths (<4 nm) and short radiative lifetimes of excitonic emissions, we conclude that localizing valence states associated with atomic condensates of In-N preferentially capture holes, which have a positive charge similar to positrons. The holes form localized excitons to emit the light, although some of the excitons recombine at non-radiative centres. The enterprising use of atomically inhomogeneous crystals is proposed for future innovation in light emitters even when using defective crystals.

The origin of the two-dimensional electron gas (2DEG) in AlGaN/GaN heterostructure field effect transistors is examined theoretically and experimentally. Based on an analysis of the electrostatics, surface states are identified as an important source of electrons. The role of the polarization-induced dipole is also clarified. Experimental Hall data for nominally undoped Al0.34Ga0.66N/GaN structures indicate that ∼1.65 eV surface donors are the actual source of the electrons in the 2DEG, which forms only when the barrier thickness exceeds 35 Å.

This paper presents growth orientation dependence of the piezoelectric polarization of InxGa1−xN and AlyGa1−yN layers lattice matched to GaN. This topic has become relevant with the advent of growing nitride based devices on semipolar planes [A. Chakraborty et al., Jpn. J. Appl. Phys., Part 2 44, L945 (2005)]. The calculations demonstrate that for strained InxGa1−xN and AlyGa1−yN layers lattice matched to GaN, the piezoelectric polarization becomes zero for nonpolar orientations and also at another point ≈45° tilted from the c plane. The zero crossover has only a very small dependence on the In or Al content of the ternary alloy layer. With the addition of spontaneous polarization, the angle at which the total polarization equals zero increases slightly for InxGa1−xN, but the exact value depends on the In content. For AlyGa1−yN mismatched layers the effect of spontaneous polarization becomes important by increasing the crossover point to ∼70° from c-axis oriented films. These calculations were performed using the most recent and convincing values for the piezoelectric and elasticity constants, and applying Vegard’s law to estimate the constants in the ternary InxGa1−xN and AlyGa1−yN layers.

The Oxford-Diamond In Situ Cell for studying chemical reactions using time-resolved X-ray diffraction Rev. Sci. Instrum. 83, 084101 (2012) Synchrotron-based ultrafast x-ray diffraction at high repetition rates Rev. Sci. Instrum. 83, 063303 (2012) Shortening x-ray pulses for pump-probe experiments at synchrotrons J. Appl. Phys. 109, 126104 (2011) High-pressure and high-temperature x-ray diffraction cell for combined pressure, composition, and temperature measurements of hydrides Rev. Sci. Instrum. 82, 065108 (2011) High resolution short focal distance Bent Crystal Laue Analyzer for copper K edge x-ray absorption spectroscopy Rev. Sci. Instrum. 82, 063106 (2011) Additional information on Appl. Phys. Lett.

The characteristic surface morphologies of GaN grown by plasma-assisted molecular beam epitaxy under various growth conditions have been investigated. Three growth regimes (one N stable and two Ga stable) are identified on a surface structure diagram (Ga/N ratio versus substrate temperature). The boundary between the N-stable regime (low Ga/N ratios) and the two Ga-stable regimes (high Ga/N ratios) is determined by the growth rate of the films and is constant over the range of substrate temperatures investigated. The boundary between the two Ga-stable regimes (the Ga-droplet regime and the intermediate regime) is determined by the formation of Ga droplets and has an Arrhenius dependence with substrate temperature. The characteristic morphologies of films grown within each of these regimes are investigated using atomic force microscopy and transmission electron microscopy. N-stable films have rough, heavily pitted morphologies. Films grown within the intermediate phase have areas of flat surface between large, irregularly shaped pits. The pits observed for films grown within both regimes are found to initiate from threading dislocations and to decrease in density with increasing Ga/N ratio at constant temperature. Ga-stable films, grown within the Ga-droplet regime, exhibit atomically flat surfaces with no pit features. The morphology transitions are associated with changes in the growth kinetics caused by variations in the coverage of the GaN surface by excess Ga.

We report on the unambiguous detection of Auger electrons by electron emission spectroscopy from a cesiated InGaN/GaN light emitting diode (LED) under electrical injection. Electron emission spectra were measured as a function of the current injected in the device. The appearance of high energy electron peaks simultaneously with an observed drop in electroluminescence efficiency shows that hot carriers are being generated in the active region (InGaN quantum wells) by an Auger process. A linear correlation was measured between the high energy emitted electron current and the "droop current" -the missing component of the injected current for light emission. We conclude that the droop phenomenon in GaN LED originates from the excitation of Auger processes.

In this letter we describe the structural characteristics of nonpolar (112̄0) a-plane GaN thin films grown on (11̄02) r-plane sapphire substrates via metalorganic chemical vapor deposition. Planar growth surfaces have been achieved and the potential for device-quality layers realized by depositing a low temperature nucleation layer prior to high temperature epitaxial growth. The in-plane orientation of the GaN with respect to the r-plane sapphire substrate was confirmed to be [0001]GaN‖[1̄101]sapphire and [1̄100]GaN‖[112̄0]sapphire. This relationship is explicitly defined since the polarity of the a-GaN films was determined using convergent beam electron diffraction. Threading dislocations and stacking faults, observed in plan-view and cross-sectional transmission electron microscope images, dominated the a-GaN microstructure with densities of 2.6×1010 cm−2 and 3.8×105 cm−1, respectively. Submicron pits and crystallographic terraces were observed on the optically specular a-GaN surface with atomic force microscopy.