No abstract

Group-III-nitride semiconductors have shown enormous potential as light sources for full-colour displays, optical storage and solid-state lighting. Remarkably, InGaN blue- and green-light-emitting diodes (LEDs) emit brilliant light although the threading dislocation density generated due to lattice mismatch is six orders of magnitude higher than that in conventional LEDs. Here we explain why In-containing (Al,In,Ga)N bulk films exhibit a defect-insensitive emission probability. From the extremely short positron diffusion lengths (<4 nm) and short radiative lifetimes of excitonic emissions, we conclude that localizing valence states associated with atomic condensates of In-N preferentially capture holes, which have a positive charge similar to positrons. The holes form localized excitons to emit the light, although some of the excitons recombine at non-radiative centres. The enterprising use of atomically inhomogeneous crystals is proposed for future innovation in light emitters even when using defective crystals.

A near-band-edge bluish electroluminescence (EL) band centered at around 440 nm was observed from ZnO p-i-n homojunction diodes through a semi-transparent electrode deposited on the p-type ZnO top layer. The EL peak energy coincided with the photoluminescence peak energy of an equivalent p-type ZnO layer, indicating that the electron injection from the n-type layer to the p-type layer dominates the current, giving rise to the radiative recombination in the p-type layer.The imbalance in charge injection is considered to originate from the lower majority carrier concentration in the p-type layer, which is one or two orders of magnitude lower than that in the n-type one. The current-voltage characteristics showed the presence of series resistance of several hundreds ohms, corresponding to the current spread resistance within the bottom n-type ZnO. The employment of conducting ZnO substrates may solve the latter problem.

Temperature-dependent cathodoluminescence spectra were measured from (001) unintentionally doped, (100) Si-doped, and (010) Mg-doped β-Ga2O3 substrates prepared by either the floating zone growth or edge-defined film-fed growth methods. Although β-Ga2O3 is expected to be an indirect bandgap material, direct Γ-Γ transitions were found to be dominant in the optical transmittance spectra. The substrates exhibited no near-band-edge emission and instead exhibited ultraviolet luminescence, blue luminescence (BL), and green luminescence bands. Since the BL intensity strongly depended on the resistivity in the crystals, there was evidence of a correlation between the BL intensity and formation energy of oxygen vacancies.

The polarized transmittance and reflectance spectra of β-Ga2O3 crystals are investigated, and the data are interpreted in terms of the monoclinic crystal band structure. The energies of the absorption edge can be divided into six ranges, and these ranges can be assigned to the transitions from the valence bands to the conduction band minimum according to the selection rules. The indirect bandgap-energy of 4.43 eV is smaller than the direct bandgap-energy of 4.48 eV at RT; and the energy difference of 0.05 eV nearly matches the theoretically calculated values of 0.03–0.04 eV.

Room-temperature nonradiative lifetime (τnr) of the near-band-edge excitonic photoluminescence (PL) peak in {0001} polar, (112¯0), (11¯00), and (001) nonpolar GaN was shown to increase with the decrease in density or size of Ga vacancies (VGa) and with the decrease in gross density of point defects including complexes, leading to the increase in the PL intensity. As the edge threading dislocation density decreased, density or size of VGa tended to decrease and τnr tended to increase. However, there existed remarkable exceptions. The results indicate that nonradiative recombination process is governed not by single point defects, but by certain defects introduced with the incorporation of VGa, such as VGa-defect complexes.

The internal quantum efficiency (ηint) of the near-band-edge (NBE) excitonic photoluminescence (PL) in ZnO epilayers was significantly improved by eliminating point defects, as well as by the use of ZnO high-temperature-annealed self-buffer layer (HITAB) on a ScAlMgO4 substrate as epitaxial templates. Negatively charged Zn vacancy (VZn) concentration was greatly reduced by high-temperature growth, and slower postgrowth cooling (annealing) under minimum oxygen pressure further reduced the gross concentration of positively and negatively charged and neutral point defects, according to the suppression of nonequilibrium defect quenching. The nonradiative PL lifetime (τnr) at room temperature was increased by decreasing the gross concentration of point defects, as well as by decreasing the concentration of VZn. Accordingly, certain point defect complexes incorporated with VZn (VZn-X complexes) are assigned to the dominant nonradiative recombination centers. As a result of the elimination of point defects, a record long τnr (3.8ns) at 300K was demonstrated. Because the radiative lifetime (τr) is in principle constant in bulk and epitaxial ZnO, the increase in τnr gave rise to the increase in ηint. Rich structures originating from exciton-polaritons and excited states of excitons were eventually observed in the low-temperature PL spectrum of the improved ZnO epilayer on HITAB, of which ηint of the NBE emission was 6.3% at 300K.

We have grown nitrogen-doped Mg x Zn 1−x O : N films on Zn-polar ZnO single crystal substrates by molecular beam epitaxy. As N-sources, we employed NO-plasma or NH 3 gas itself. As x increased, optimum growth temperature window for smooth film morphology shifted to higher temperatures, while maintaining high N-concentration ͑ϳ1 ϫ 10 19 cm −3 ͒. The heterosructures of Mg x Zn 1−x O:N ͑0.1Յ x Յ 0.4͒ / ZnO were fabricated into light emitting diodes of 500-m-diameter. We observed ultraviolet near-band-edge emission ͑ ϳ 382 nm͒ with an output power of 0.1 W for a NO-plasma-doped LED and 70 W for a NH 3-doped one at a bias current of 30 mA.